화학공학소재연구정보센터
Korean Journal of Materials Research, Vol.20, No.12, 676-680, December, 2010
RF 마그네트론 스퍼터링을 이용한 p 타입 투명전도 산화물 SrCu2O2 박막의 제조
Fabrication of P-type Transparent Oxide Semiconductor SrCu2O2 Thin Films by RF Magnetron Sputtering
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Most TCOs such as ITO, AZO(Al-doped ZnO), FTO(F-doped SnO2) etc., which have been widely used in LCD, touch panel, solar cell, and organic LEDs etc. as transparent electrode material reveal n-type conductivity. But in order to realize transparent circuit, transparent p-n junction, and introduction of transparent p-type materials are prerequisite. Additional prerequisite condition is optical transparency in visible spectral region. Oxide based materials usually have a wide optical bandgap more than ~3.0 eV. In this study, single-phase transparent semiconductor of SrCu2O2, which shows p-type conductivity, have been synthesized by 2-step solid state reaction at 950oC under N2 atmosphere, and single-phase SrCu2O2 thin films of p-type TCOs have been deposited by RF magnetron sputtering on alkali-free glass substrate from single-phase target at 500oC, 1% H2/(Ar + H2) atmosphere. 3% H2/(Ar + H2) resulted in formation of second phases. Hall measurements confirmed the p-type nature of the fabricated SrCu2O2 thin films. The electrical conductivity, mobility of carrier and carrier density 5.27 × 10.2 S/cm, 2.2 cm2/Vs, 1.53 × 1017/cm3 a room temperature, respectively. Transmittance and optical band-gap of the SrCu2O2 thin films revealed 62% at 550 nm and 3.28 eV. The electrical and optical properties of the obtained SrCu2O2 thin films deposited by RF magnetron sputtering were compared with those deposited by PLD and e-beam.
  1. Tark SJ, Kang MG, Kim D, Korean J. Mater. Res., 16(7), 449 (2006)
  2. Kawazoe H, Yasukawa M, Hyodo H, Kurita M, Yanagi H, Hosono H, Nature, 389(6654), 939 (1997)
  3. Yanagi H, Kawazoe H, Kudo A, Yasukawa M, Hosono H, J. Electron., 4, 407 (2000)
  4. Yanagi H, Hase T, Ibuki S, Ueda K, Hosono H, Appl. Phys. Lett., 78, 1583 (2001)
  5. Duan N, Sleight AW, Jayaraj MK, Tate J, Appl. Phys. Lett., 77, 1325 (2000)
  6. Kudo A, Yanagi H, Hosono H, Kawasoe H, Appl. Phys. Lett., 73, 220 (1998)
  7. Papadopoulou EL, Viskadourakis ZA, Pennos AV, Huyberechts G, Aperathitis E, Thin Solid Films, 516(7), 1449 (2008)
  8. Bobeico E, Varsano E, Minarini C, Roca F, Thin Solid Films, 444(1-2), 70 (2003)
  9. Suzuki RO, Bohac P, Gauckler LJ, J. Am. Ceram. Soc., 75, 2833 (1992)
  10. Tate J, Jayaraj MK, Draeseke AD, Ulbrich T, Sleight AW, Vanaja KA, Nagarajan R, Wager JF, Hoffman RL, Thin Solid Films, 411(1), 119 (2002)
  11. Tonooka K, Shimokawa K, Nishimura O, Thin Solid Films, 411(1), 129 (2002)