The properties of carbon films prepared by thermal chemical vapor deposition (thermal CVD) using camphor are investigated. As the deposition temperature increases from 1098 to 1198 K, the deposition rate follows the Arrhenius law with activation energy of 59.8 kJ/mol. The possible reaction paths and intermediate species of this thermal CVD process are also considered. The product gases CH3, CH4, and C2H2 can be speculated as the main species for pyrolytic carbon deposition. The crystallinity and ordering degree of carbon films decrease with increasing the deposition temperature. Nevertheless, the sp(2) carbon sites increase with increasing the deposition temperature, and results in the decrease of electrical resistivity and the increase of water contact angle. When the camphor weight changes from 0.06 to 0.50 g, the CVD reaction is controlled by a process of half order. Moreover, as the camphor weight increases from 0.30 to 0.50 g, the surfaces of carbon films are partially covered with spherical particles, the water contact angle substantially increases. Finally, the results of this work are compared to those of using CH4 and C2H2 as the precursor gases. (C) 2014 Elsevier B.V. All rights reserved.