화학공학소재연구정보센터
홈 로그인 로그아웃 연락처 사이트맵
Clean Technology, Vol.5, No.1, 62-77, June, 1999
Export Citation
반도체 세정 공정에서의 청정 기술 동향
Cleaner Technologies for Semiconductor Cleaning Processes
조영성, 이종협
초록
전자 및 컴퓨터 산업의 발전으로 반도체 산업은 비약적으로 발전하고 있다. 그러나 반도체 제조 공정에서 필수적으로 사용되는 각종 환경 오염 물질에 대한 규제가 세계적으로 강화되고 있어 반도체 업계의 적극적인 환경 대응책이 없이는 반도체 수출에 대한 선진국의 제재를 피하기 어렵다. 따라서 본 연구에서는 청정 기술 측면에서, 반도체 산업의 환경영향 개선을 위한 세정 공정의 기술적 대체 방안에 대하여 조사하였다. 세정 공정의 대안으로서 기상 세정 공정, UV 사용 공정, 플라즈마 사용 공정을 조사하였으며, 각 공정의 장단점을 비교하였다.
Semiconductor industry has rapidly grown because of the need from electronic and computer industries. However the global environmental regulations for various hazardous chemical compounds, which are indispensably used in semiconductor manufacturing process, are getting stronger. The semiconductor industries should develop the cleaner technologies in order to both lead the future world market and avoid the regulations form environmentally developed countries. In this paper, cleaner technologies for semiconductor cleaning processes are surveyed, such as gas phase process, UV process, and plasma process. Advantages and disadvantages of these processes are discussed.
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