A facile strategy for fabricating hierarchically micro-and nano-scale ordered features as antireflection coating is developed. Compared to conventional lithographic techniques, this process exhibits the advantages of low cost and high efficiency. Only two fabrication steps are required by combining colloidal crystal self-assembly with solvent vapor annealing at the air/water interface. These special hierarchically ordered arrays demonstrate fine structure-enhanced antireflection properties in the near-infrared spectral region ranging from 1100 nm to 1800 nm, which may be highly valuable for designing many optoelectronic devices. (C) 2013 Elsevier B. V. All rights reserved.