In this study we investigated the influence of cobalt thickness (from 50 nm to 10 nm) on the kinetics and texture of CoSi2 layers. In-situ X-ray diffraction measurements were performed during isothermal annealing to determine CoSi2 kinetics as explained in a previous publication. Decreasing the initial cobalt thickness (50 nm, 30 nm, and 10 nm) induces a slowdown of the formation rate, especially for the 10 nm Co layer. A model based on CoSi2 nucleation is used to explain this phenomenon. (C) 2012 Elsevier B.V. All rights reserved.