As the thickness of crystalline silicon solar cells decreases, light loss cannot be avoided due to the absorption limit in long wavelength light. Internal rear side reflection can be enhanced by polishing the rear surface. The rear polishing processes are performed before the texturing and before and after doping the emitter layer to optimize the solar cell fabrication process sequences. All cells made by rear surface polishing showed improved light trapping in long wavelength region (900-1100 nm) compared to that in the conventional cells. However, silicon solar cells fabricated by rear polishing before and after doping have similar (35.5 mA/cm(2)) or lower (35.26 mA/cm(2)) short circuit current density compared to the cells produced by the conventional process (35.59 mA/cm(2)) due to pore damage to the anti-reflection layer and the surface of the emitter layer during rear polishing. This surface damage was effectively prevented adapting the rear surface polishing before the front surface texturing, which led to increasing the current density from 35.59 to 36.29 mA/cm(2). (C) 2011 Elsevier Ltd. All rights reserved.