The adsorbability of 1,1,1,2-tetrafluoroethane (HFC134a), which has been the CFC12 replacement, onto tetrafluoromethane and tetrachloromethane plasma-treated activated carbon (FT-ACs and CT-ACs) was investigated. It is proved that the fluorine and the chlorine, which were produced by plasma treatment, were introduced into the pores having radii greater 7.5 Angstrom and with less than 7.5 Angstrom by plasma treatment, respectively. The adsorption site of HFC134a onto activated carbon may change with the quantities of fluorine or chlorine on the surface of the activated carbon. The amount of HFC134a adsorbed per unit specific surface area of FT-ACs and CT-ACs slightly increased a little compared to the untreated activated carbon (U-AC). The amount of fluoride ion eluted before the adsorption of HFC134a from the FT-ACs increased with the increasing plasma treatment time. That after the adsorption of HFC134a from only the activated carbon with the shortest plasma treatment time decreased. The amount of chloride ion eluted before the adsorption of HFC134a from the CT-ACs increased after 15 min of plasma treatment, but decreased with 30 min of plasma treatment. The chloride ion amount from the CT-ACs decreased after the adsorption of HCF134a. These results could be explained by the Langmuir constants a and Ws, which represent the adsorption equilibrium constant and the saturated amount of HFC134a adsorbed, respectively. The ratio of fluorine and chlorine species, the adsorption type, the layer interstitial type, and the covalent type, is different based on the plasma treatment time. It is concluded that the amount of HFC134a adsorbed onto the FT-ACs and CT-ACs did not depend upon the change of pore structure by the fluorine and chlorine.