Nano-scale SiC-based ceramic patterns on Si substrates were fabricated via imprint lithography technique by using viscous polyvinylsilane as a ceramic precursor and economic nano-scale master such as CD, followed by pyrolysis at 800 degrees C under nitrogen atmosphere. The thickness of residual layers was controlled by varying the spin-coating conditions (solution concentration, spinning speed) and the patterning conditions (molding pressure). In addition, for the effective removal of the remaining residual layer, the etching kinetics of both polymeric and ceramic patterns was also comparatively studied by Ar or reactive ion etching process.