The texture orientation of 2.5, 5, and 100 nm thick Mo films grown by sputter deposition on SiO2 membranes at room temperature has been studied quantitatively using transmission electron microscopy. The sample tilt angle dependent diffraction patterns of these films revealed a fiber texture with the [110] out-of-plane direction for all film thicknesses. Films grown at different sputtering power and substrate target distance showed a similar texture orientation. These results would imply that the growth was in zone II, according to the microstructure classification of the structural zone model. This is in contrast to the conventional assignment of zone I for Mo deposition at room temperature based on the low Mo homologous temperature of similar to 0.1. It was found that texture dispersion was reduced as the thickness of the film increased. Possible mechanisms, including energetic particles bombardment during growth, which could affect the surface mobility and texture of the films, were discussed. (C) 2014 Elsevier B.V. All rights reserved.