For the first time, galvanic deposition of Ti is reported from aqueous solutions containing 17 mM HF and 10 mM K2TiF6 at pH 2.73 onto Al 6061 alloy. X-ray diffraction yields peaks consistent with a polycrystalline Ti deposit, and electrical resistivity measurements are also consistent with metallic Ti, not TiO2. Elemental analysis by energy dispersive X-ray (EDX) spectroscopy demonstrates the as-deposited film contains similar to 90 atom% Ti. The galvanic Ti deposit improves the corrosion resistance of the underlying Al substrate, as illustrated by voltammetry and electrochemical impedance spectroscopy studies in several electrolytes. Deposition for 30 h. yields a 14 mu m thick, silver-gray Ti film. (C) 2014 The Electrochemical Society. All rights reserved.