Tantalum nitride (TaN) thin films are deposited on AISI 316L stainless steel by inductively coupled, plasma-assisted, reactive magnetron sputtering at various N-2 flow rates. TaN film behavior is investigated in simulated polymer electrolyte membrane fuel cell (PEMFC) conditions by using electrochemical measurement techniques for application as bipolar plates. The results of a potentio-dynamic polarization test under PEMFC cathodic and anodic conditions indicate that the corrosion current density of the TaNx films is of the order of 10(-7) A cm(-2) (at 0.6 V) and 10(-8) A cm(-2) (at -0.1 V), respectively; these results are considerably better than the individual results for metallic Ta films and AISI 316L stainless steel. The TaNx films exhibit superior stability in a potentio-static polarization test performed under PEMFC cathodic and anodic conditions. The interfacial contact resistance of the films is measured in the range of 50-150 N cm(-2), and the lowest value is 11 m Omega cm(2) at a compaction pressure of 150 N cm(-2). Copyright (C) 2011, Hydrogen Energy Publications, LLC. Published by Elsevier Ltd. All rights reserved.