International Journal of Hydrogen Energy, Vol.36, No.7, 4491-4497, 2011
Effect of the chemical nature and concentration of palladium (II) precursors on the palladium deposition by atomic hydrogen electrochemically assisted
deposits are obtained by applying -1.92 mA cm(-2) during 180 min, employing 0.06 M PdCl(2) + 1 M HCl and 0.06 M PdCl(2) + 28% NH(3) solutions. Some features on Pd depositions using x M PdCl(2) + 1 M HCl (x = 0.130, 0.060, 0.030, 0.025, 0.020 and 0.010) solutions are detailed. Based on roughness factor (S) and deposition efficiency (epsilon(Pd)) values, Pd deposition is more efficient using PdCl(2) + 1 M HCl than PdCl(2) + 28% NH(3) (epsilon(Pd) = 99%, S = 6 in 1 M HCl vs. epsilon(Pd) = 17%, S = 3 in 28% NH(3)). A highly rough Pd deposit (S = 357) is obtained, by applying -1.92 mA cm(-2) during 180 min, using a 0.020 M PdCl(2) + 1 M HCl solution. Copyright (C) 2011, Hydrogen Energy Publications, LLC. Published by Elsevier Ltd. All rights reserved.
Keywords:Atomic hydrogen;Hydrogen permeation;Palladium deposition;Palladium black;Chemical reduction