혼합용매내에서 단분산 Al<sub>2</sub>O<sub>3</sub> 미립자의 합성에 대한 전해질 첨가 효과

김현진; 박성규; 배성렬; 김희택; Hyun Jin Kim; Sung Kyoo Park; Seong Youl Bae; Hee Taik Kim

Journal of the Korean Industrial and Engineering Chemistry, Vol.11, No.2, 206-211, April, 2000

Export Citation

혼합용매내에서 단분산 Al₂O₃ 미립자의 합성에 대한 전해질 첨가 효과

Effect of Electrolytes on Synthesis of Monodispersed Al₂O₃ Fine Particles in Mixed Solvents

김현진, 박성규¹, 배성렬 ¹, 김희택 ^{1, †}

동진화성공업(주)
¹한양대학교 공학대학 화학공학과, 안산 425-791

Hyun Jin Kim, Sung Kyoo Park¹, Seong Youl Bae¹, and Hee Taik Kim^{1, †}

Dpngjin Semichem Co. Ltd., Korea
¹Department of Chemical Engineering, Hanyang University, Ansan 425-791, Korea

E-mail:

초록

에멀젼법을 이용하여 가수분해 속도가 빠른 Al (sec-OC₄H₉)₃ 로부터 응집이 없고 입도 분포가 좁은 단분산 알루미나 미립자를 얻었으며 가수분해 속도를 조절하기 위하여 소수성 용매인 n-octanol과 친수성 용매인 acetonitrile의 혼합 용매를 이용하였다. 또한 분산상의 안정성을 유지하여 생성된 미립자의 응집을 방지하기 위하여 혼합용매에 전해질을 첨가한 후 이들의 효과를 살펴보았다. 실험결과, 단분산 알루미나 미립자를 얻기 위한 최적조건은 온도 10℃에서, Al (sec-OC₄H₉)₃, 0.05M, H₂O 0.1M, 50 vol% n-octanol, 40 vol% acetonitrile, 10 vol% ethanol이었으며, 이때 전해질 HCI의 농도는 10^-2M 이었다.

To obtain unagglomerated, narrow size distributed, and monodispersed Al₂O₃ fine particles from Al(sec-OC₄H₉)₃, emulsion method was used. Acetonitrile as a hydrophilic solvent and n-octanol as a hydrophobic solvent were used in order to control the hydrolysis rate of Al(sec-OC₄H₉)₃. Electroytes were added in mixed solvent to prevent the fine particles from aggregating and its effect was investigated. It was found that optimal synthetic conditions of monodispersed alumina fine particles were 0.05M Al-alkoxide, 0.1M H₂O, 50 vol% n-octanol, 40 vol% acetonitrile, 10 vol% ethanol, and 10^-2 M HCI under 10℃ reaction temperature.

Keywords:emulsion;method;hydrophilic;hydrophobic;monodispersed

[References]

Yoldas BE, J. Am. Ceram. Soc., 65(8), 387 (1982)
Lukasiewiez, J. Am. Ceram. Soc., 72(4), 617 (1989)
Pickles DG, Lilley E, J. Am. Ceram. Soc., 68(9), C222 (1985)
Yoldas BE, J. Am. Ceram. Soc. Bull., 54(3), 289 (1975)
Yoldas BE, J. Mater. Sci., 21, 1087 (1986)
Ogihara T, Mizutani N, Kato M, J. Am. Ceram. Soc., 72(3), 421 (1989)
Ogihara T, Ikemoto T, Mizutani N, Kato M, J. Mater. Sci., 21, 2771 (1986)
Messing GL, Minehan WT, J. Ceram. Soc. Jpn., 99(10), 1036 (1991)
Hardy AB, Gowda G, Mcmahon TJ, Riman RE, Rhine WE, Bowen HK, "Ultrastructure Processing of Advanced Ceramics," Wiley, New York, 407 (1988)
Hench LL, West JK, Chem. Rev., 90, 33 (1990)
Barringer EA, Bowen HK, Com. Am. Ceram. Soc., 65(12), C199 (1982)
Jean JH, Ring YA, Process Brit. Ceram. Soc., 38, 11 (1984)
Jean JH, Ring YA, Am. Ceram. Soc. Bull., 65(12), 1574 (1986)
Nakanishi K, Takamiya Y, Shimohira T, J. Ceram. Soc. Jpn., 94(10), 1023 (1986)
Ogihara T, Yanagawa T, Ogata N, Yoshida K, J. Ceram. Soc. Jpn., 101(3), 315 (1993)
Lee SK, Shinozaki K, Mizutani N, J. Ceram. Soc. Jpn., 101(4), 470 (1993)
Ogihara T, Nakajima H, Yanagawa T, Ogata N, Yoshida K, Matsushita N, J. Am. Ceram. Soc., 74(9), 2263 (1991)
Mizutani N, Ikeda M, Lee SK, Shinozaki K, Kato M, J. Ceram. Soc. Jpn., 99(2), 183 (1991)
Ogihara T, Yanagawa T, Ogata N, Yoshida K, Iguchi M, Narata N, Ogawa K, J. Ceram. Soc. Jpn., 102(8), 778 (1994)
Sarikaya Y, Akine M, Ceram. Int., 14, 239 (1988)
Ayral A, Phalippou J, Droguet JC, Mater. Res. Soc., 121, 239 (1988)
Maher GH, Hutchins CE, Ross SD, Am. Ceram. Soc. Bull., 72(5), 72 (1993)
Ogihara T, Wada K, Yoshida T, Yanagawa T, Ogata N, Yoshida K, Matsushita N, Ceram. Int., 19, 159 (1993)
Look JL, Zukoski CF, J. Am. Ceram. Soc., 75(6), 1587 (1992)
Pugh RJ, Bergstom L, "Surface and Colloid Chemistry in Advanced Ceramics Processing," Vol. 51, Marcel Dekker, New York, pp. 136-138 (1994)

[Related Articles]

[1] Yoldas BE, J. Am. Ceram. Soc., 65(8), 387 (1982)

[2] Lukasiewiez, J. Am. Ceram. Soc., 72(4), 617 (1989)

[3] Pickles DG, Lilley E, J. Am. Ceram. Soc., 68(9), C222 (1985)

[4] Yoldas BE, J. Am. Ceram. Soc. Bull., 54(3), 289 (1975)

[5] Yoldas BE, J. Mater. Sci., 21, 1087 (1986)

[6] Ogihara T, Mizutani N, Kato M, J. Am. Ceram. Soc., 72(3), 421 (1989)

[7] Ogihara T, Ikemoto T, Mizutani N, Kato M, J. Mater. Sci., 21, 2771 (1986)

[8] Messing GL, Minehan WT, J. Ceram. Soc. Jpn., 99(10), 1036 (1991)

[9] Hardy AB, Gowda G, Mcmahon TJ, Riman RE, Rhine WE, Bowen HK, "Ultrastructure Processing of Advanced Ceramics," Wiley, New York, 407 (1988)

[10] Hench LL, West JK, Chem. Rev., 90, 33 (1990)

[11] Barringer EA, Bowen HK, Com. Am. Ceram. Soc., 65(12), C199 (1982)

[12] Jean JH, Ring YA, Process Brit. Ceram. Soc., 38, 11 (1984)

[13] Jean JH, Ring YA, Am. Ceram. Soc. Bull., 65(12), 1574 (1986)

[14] Nakanishi K, Takamiya Y, Shimohira T, J. Ceram. Soc. Jpn., 94(10), 1023 (1986)

[15] Ogihara T, Yanagawa T, Ogata N, Yoshida K, J. Ceram. Soc. Jpn., 101(3), 315 (1993)

[16] Lee SK, Shinozaki K, Mizutani N, J. Ceram. Soc. Jpn., 101(4), 470 (1993)

[17] Ogihara T, Nakajima H, Yanagawa T, Ogata N, Yoshida K, Matsushita N, J. Am. Ceram. Soc., 74(9), 2263 (1991)

[18] Mizutani N, Ikeda M, Lee SK, Shinozaki K, Kato M, J. Ceram. Soc. Jpn., 99(2), 183 (1991)

[19] Ogihara T, Yanagawa T, Ogata N, Yoshida K, Iguchi M, Narata N, Ogawa K, J. Ceram. Soc. Jpn., 102(8), 778 (1994)

[20] Sarikaya Y, Akine M, Ceram. Int., 14, 239 (1988)

[21] Ayral A, Phalippou J, Droguet JC, Mater. Res. Soc., 121, 239 (1988)

[22] Maher GH, Hutchins CE, Ross SD, Am. Ceram. Soc. Bull., 72(5), 72 (1993)

[23] Ogihara T, Wada K, Yoshida T, Yanagawa T, Ogata N, Yoshida K, Matsushita N, Ceram. Int., 19, 159 (1993)

[24] Look JL, Zukoski CF, J. Am. Ceram. Soc., 75(6), 1587 (1992)

[25] Pugh RJ, Bergstom L, "Surface and Colloid Chemistry in Advanced Ceramics Processing," Vol. 51, Marcel Dekker, New York, pp. 136-138 (1994)