초음파분무열분해에 의한 투명전도성 산화주석막의 제조

김상길; 윤천호

Journal of the Korean Industrial and Engineering Chemistry, Vol.9, No.2, 214-219, April, 1998

Export Citation

초음파분무열분해에 의한 투명전도성 산화주석막의 제조

Preparation of Transparent and Conducting Tin Oxide Films by the Ultrasonic Spray pyrolysis

김상길, 윤천호

초록

초음파분무 열분해에 의하여 유리 기판 위에 투명전도성 산화주석막을 증착하였다. 증착변수가 산화주석막의 전기저항, 광투과도, 결정구조 및 두께에 미치는 영향을 조사하였다. 증착시간과 염화주석(Ⅳ)의 농도가 증가함에 따라, 증착된 산화주석막의 전기저항과 가시선 및 근적외선 영역에서의 광투과도가 감소함을 보여주었다. 공기중에서 열처리온도가 증가하면, 증착된 산화주석막은 전기저항과 광투과도가 증가함을 나타냈다. 본 연구결과는 초음파분무열분해가 단일과정으로서 양질의 투명전도막을 효율적으로 제조할 수 있는 유망한 증착기술임을 암시한다.

The transparent conducting tin oxide films were deposited on g1ass substrates by the ultrasonic spray pyrolysis. Examined were effects of deposition parameters on the electrical resistance, optical transmittance, crystal structure, and thickness of tin oxide films. As both the deposition time and concentration of tin(Ⅳ) chloride increase, the deposited tin oxide films exhibited the decrease of electrical resistance and optical transmittance in the visible and near infrared region. With increasing heat-treatment temperature in air, the deposited tin oxide films showed the enhanced electrical resistance and optical transmittance. This study suggests that the ultrasonic spray pyrolysis may be a promising deposition technique effectively to prepare transparent conducting films of good quality in a single step.

[References]

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Kunz RR, Rothschild M, Ehrlich DJ, Appl. Phys. Lett., 54, 1631 (1989)
Samson S, Fonstad CG, J. Appl. Phys., 44, 4618 (1973)
Jarzebski ZM, Marton JP, J. Electrochem. Soc., 123, 199 (1976)
Sundaram KB, Bhagavat GK, Thin Solid Films, 78, 35 (1981)
Vasu V, Subrahmanyam A, Thin Solid Films, 202, 283 (1991)
Jarzebski ZM, Marton JP, J. Electrochem. Soc., 123, 333 (1976)
Miloslabski VK, Opt. Spectr., 7, 154 (1959)
김윤수, "화학적 방법에 의한 고온초전도체의 합성에 관한 연구," 특정연구개발사업 보고서, 과학기술처 (1989)
Rumyantseva MN, Gaskov AM, Ryabova LI, Senateur JP, Chenevier B, Labeau M, Mater. Sci. Eng., B41, 333 (1996)
Laurent JM, Smith A, Smith DS, Bonnet JP, Clemente RR, Thin Solid Films, 292(1-2), 145 (1997)
Chopra KL, Major S, Pandya DK, Thin Solid Films, 102, 1 (1983)
Hamberg I, Granqvist CG, J. Appl. Phys., 60, 123 (1986)
Carroll AF, Slack LH, J. Electrochem. Soc., 123, 1889 (1976)
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Arfsten NJ, Karfmann R, Dislich H, Ultrastructural Processing of Ceramics, Glasses and Composite, eds. L.L. Hench and D.R. Ulrich, John Wiley & Sons, New York (1984)

[1] Jarzebski ZM, Marton JP, J. Electrochem. Soc., 123, 299 (1976)

[2] Kunz RR, Rothschild M, Ehrlich DJ, Appl. Phys. Lett., 54, 1631 (1989)

[3] Samson S, Fonstad CG, J. Appl. Phys., 44, 4618 (1973)

[4] Jarzebski ZM, Marton JP, J. Electrochem. Soc., 123, 199 (1976)

[5] Sundaram KB, Bhagavat GK, Thin Solid Films, 78, 35 (1981)

[6] Vasu V, Subrahmanyam A, Thin Solid Films, 202, 283 (1991)

[7] Jarzebski ZM, Marton JP, J. Electrochem. Soc., 123, 333 (1976)

[8] Miloslabski VK, Opt. Spectr., 7, 154 (1959)

[9] 김윤수, "화학적 방법에 의한 고온초전도체의 합성에 관한 연구," 특정연구개발사업 보고서, 과학기술처 (1989)

[10] Rumyantseva MN, Gaskov AM, Ryabova LI, Senateur JP, Chenevier B, Labeau M, Mater. Sci. Eng., B41, 333 (1996)

[11] Laurent JM, Smith A, Smith DS, Bonnet JP, Clemente RR, Thin Solid Films, 292(1-2), 145 (1997)

[12] Chopra KL, Major S, Pandya DK, Thin Solid Films, 102, 1 (1983)

[13] Hamberg I, Granqvist CG, J. Appl. Phys., 60, 123 (1986)

[14] Carroll AF, Slack LH, J. Electrochem. Soc., 123, 1889 (1976)

[15] 조현춘, "박막기술의 현황과 전자부품에의 응용," 산업기술정보원 조사보고서 57호 (1991)

[16] Powder Diffraction File, Sets 21-22, ed. F. McClune, JCPDS Internatinal Centre for Diffraction Data, Pennsylvania (1980)

[17] Arfsten NJ, Karfmann R, Dislich H, Ultrastructural Processing of Ceramics, Glasses and Composite, eds. L.L. Hench and D.R. Ulrich, John Wiley & Sons, New York (1984)