화학공학소재연구정보센터
Journal of the Korean Industrial and Engineering Chemistry, Vol.8, No.1, 108-113, February, 1997
질산매질에서 UV 조사에 의한 옥살산 분해
Decomposition of Oxalic Acid in Nitric Acid by UV Radiation
초록
본 연구에서는 질산매질에서 UV 광조사에 의한 옥살산 분해연구가 수행되었다. UV 광원은 2537Å의 파장을 방출하는 수은램프가 사용되었다. UV 광조사에도 불구하고 옥살산 자체는 분해되지 않았다 그러나 질산매질하에서 UV 광조사에 의해 옥살산은 쉽게 분해되었다. UV광조사에 의해 NO3-으로부터 발생되는 산소라디칼이 옥살산을 분해시키는 것으로 조사되었다. 옥살산 분해율은 질산 0.5M 부근에서 최대를 이루다가 질산농도 증가에 따라 점차 감소하였다. 이것 역시 산소라디칼과 NO3- 사이에서 반응으로 쉽게 설명될 수 있다.
Decomposition of oxalic acid was studied in nitric acid media by using UV radiations. The UV source is Hg-lamp, emitting 2537Å wavelength. Oxalic acid was not decomposed by itself in spite of UV radiation, but in the presence of nitric acid decomposed easily under UV radiation. It is believed that oxygen radical generated from nitrate ion by UV radiation results in the decomposition of oxalic acid. Decomposition rate of oxalic acid reached a maximum in around 0.5M HNO3 and then gradually decreased with nitric acid concentration. The decrease can be also explained to be due to the reaction between oxygen radical and NO3-
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