Coating stacks of HfO2/SiO2 and Ta2O5/SiO2 were separately prepared by electron beam evaporation and dual ion beam sputtering. Damage characteristics at the interlayer interfaces were analyzed after irradiation of the coatings by a 1064 nm laser. The cross-sectional morphologies of damage spots indicated that peeling-off damages always occurred at the interface where the low refractive index material (SiO2) was deposited on the high refractive index material (HfO2 or Ta2O5). The effects of interface microstructure and components on peeling-off damages were also discussed. The microstructure of the interface was not a major factor that influenced peeling-off damages. Incomplete oxides (SiOx) and Na, K, Li ions accumulated near the interface and caused the formation of micro-defects layers with nano-sized thicknesses. Micro-defects layers maybe reduced adhesion of different interfaces and formed plasmas by absorbing laser energy. Finally stripping damages happened from micro-defects layers during irradiation by a 1064 nm laser. (C) 2013 Elsevier B.V. All rights reserved.