In this study, a dual-layer of Al/Al2O3 films was deposited on the Mg-10Li-0.5Zn substrate using both techniques of magnetron sputtering and atomic layer deposition (ALD). The pre-sputtered Al interlayer has a crystalline structure and the ALD-Al2O3 film is amorphous. The Al interlayer could effectively obstruct the diffusion out of Li atoms from the Mg-10Li-0.5Zn substrate during the deposition of ALD-Al2O3 film. The Mg-10Li-0.5Zn specimen with a dual-layer of Al/Al2O3 films exhibits a much better corrosion resistance than those specimens with a single layer of sputtered Al or ALD-Al2O3. (c) 2013 Elsevier B.V. All rights reserved.