Applied Surface Science, Vol.265, 489-494, 2013
Differential ion beam sputtering of segregated phases in aluminum casting alloys
Differential sputtering of materials is an important phenomenon in materials science with many implications. One of the practical applications of this phenomenon is the modification of the interface between a substrate and coating during sputter coating of materials. Aluminum casting alloys, as common materials in many applications, are suitable candidates to investigate this phenomenon due to their phase separated microstructures. Changes at the sample surface under ion bombardment can be characterized by a range of complimentary techniques. The novel SIMS-SPM instrument used here enables a thorough investigation into the evolution of topography and composition caused by ion beam sputtering. For the alloy examined in this work, the aluminum regions are removed faster than the silicon particles. The faster oxidation rate of silicon compared to aluminum in the exposed surface can also be deduced from this study. (C) 2012 Elsevier B.V. All rights reserved.
Keywords:Secondary ion mass spectrometry (SIMS);X-ray photoelectron spectroscopy (XPS);Scanning probe microscopy (SPM);Interface;Oxide-film growth kinetics;3-Dimensional mapping