Ti-containing films have attracted many interests in last decades due to their specific properties, and can be used in many applications. Chemical vapor deposition (CVD) is an advanced manufacture technique for surface coating currently and has been widely used to prepare various surface coatings and thin films. Therefore, researchers have carried out in depth investigations on CVD Ti-containing films in the last decades. This article reviews the development of CVD Ti-containing films in the last years. Ti-containing films can be classified into pure Ti films, binary films, ternary films and quaternary films by components, and are described with extend discussion about their preparaiton, structures, properties and applications. Otherwise, the techniques based on CVD method and the Ti-precursors for Ti-containing films will be presented in the article. (C) 2013 Elsevier Ltd. All rights reserved.