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Thin Solid Films, Vol.520, No.21, 6451-6454, 2012
Auto-organizing ZrAlN/ZrAlTiN/TiN multilayers
The possibility to form secondary phases during annealing of a two-phase ternary nitride material is studied. By the use of an initial multilayer structure the new phase forms at the sublayer interfaces, resulting in an enhanced layering of the film. This is illustrated by a ZrAlN/TiN thin film where formation of a cubic structure ZrTi(Al)N phase at the sublayer interfaces improves the mechanical properties after annealing above 900 degrees C. (C) 2012 Elsevier B.V. All rights reserved.
Keywords:Multilayer thin films;Physical vapor deposition;Scanning transmission electron microscopy;Hardness;Zirconium aluminum nitride