Thin Solid Films, Vol.520, No.13, 4486-4492, 2012
Orientation-dependent phase separation of GaAsSb epilayers grown by gas-source molecular-beam epitaxy
This work describes a regular solution model that considers the free energy of the surface monolayer to explain the orientation-dependent phase separation in GaAsSb. In the proposed model, only the interaction between the second nearest-neighboring atoms sitting on the same monolayer contributes to the interaction parameter. Consequently, the parameter reduces to Omega/2 and Omega/3 for (111)B GaAsSb and (100) GaAsSb, where Omega denotes the parameter of bulk GaAsSb. By including the strain effect, the proposed model thoroughly elucidates the immiscibility behavior of (111)B GaAsSb and (100) GaAsSb. (C) 2012 Elsevier B.V. All rights reserved.
Keywords:Molecular beam epitaxy;Semiconducting III-V materials;Phase separation;Regular solution model;GaAsSb