Control of large area VHF plasma produced at high pressure

Nishimiya T; Yamane T; Takeuchi Y; Yamauchi Y; Takatsuka H; Muta H; Uchino K; Kawai Y

Thin Solid Films, Vol.519, No.20, 6931-6934, 2011

DOI10.1016/j.tsf.2011.01.379 Export Citation

Control of large area VHF plasma produced at high pressure

Nishimiya T, Yamane T, Takeuchi Y, Yamauchi Y, Takatsuka H, Muta H, Uchino K, Kawai Y

The control of very high frequency (VHF) discharge plasma at high pressures was attempted by loading a variable capacitor to the end of the multi rod electrode with which VHF plasma (frequency 60 MHz) was produced. It was found that the discharge region is controlled with the variable capacitor and VHF plasma uniform over 1 m is produced at high pressures. (C) 2011 Elsevier B.V. All rights reserved.

Keywords:Short gap VHF discharge;Large area deposition;Microcrystalline silicon;Multi rod electrode;Plasma energy density