Thin Solid Films, Vol.519, No.1, 499-504, 2010
Unipolar resistive switching behavior of BiFeO3 thin films prepared by chemical solution deposition
Bismuth ferrite (BiFeO3, BFO) thin films were spin-coated on Pt/Ti/SiO2/Si substrates by a chemical solution deposition method. The ferroelectric BFO films annealed at 500 degrees C and 550 degrees C were found to possess unipolar resistive switching behaviors. The resistance ratio of the high resistance state (HRS) to the low resistance state (LRS) of the unipolar resistance switching is about 10(3) for the ferroelectric BFO films. The conduction mechanisms are concluded to be space charge-limited conduction for the initial state and Ohmic conduction for the LRS. As for the HRS, the Poole-Frenkel emission fits well in the whole voltage region. Traps composed of oxygen vacancies are considered to play a key role in forming conducting paths. The relaxation time of electronic carriers is much shorter than that of ionic oxygen vacancies; therefore, the resistance switching is considered more probably due to carrier injection and emission through the Poole-Frenkel model after forming. (C) 2010 Elsevier B.V. All rights reserved.
Keywords:Ferroelectric properties;Bismuth ferrite;Unipolar resistive switching;Chemical deposition;X-ray diffraction