MgF(2) and TiO(2) single layers and layer stacks were produced by a spin-coating sol-gel process The final temperature treatment was carried out at 100 degrees C The layers were deposited onto silicon and fused silica substrates and were analysed by means of atomic force microscopy, X-ray photoelectron spectroscopy, transmission electron microscopy. ellipsometry. and UV-vis transmission spectroscopy MgF(2) and TiO(2) single layers have morphological and optical properties comparable with physical vapour deposited layers. By using spectroscopic mapping ellipsometry, a good inter- and ultra-sample homogeneity was confirmed. Multiple deposition steps result in a linear increase of layer thickness Various films were deposited with thicknesses between 25 nm and 350 nm It was shown that the low temperature sol-gel process results in films of optical quality. Anti-reflective and high reflective layer stacks consisting of MgF(2) and TiO(2) were designed and can be produced now by a sol-gel process, whereas the MgF(2) layers in the layer stacks contains also traces of MgF(2-2x)O(x). (C) 2010 Elsevier B V. All rights reserved