화학공학소재연구정보센터
Thin Solid Films, Vol.518, No.19, 5457-5462, 2010
Structural and electrochromic properties of TiO2 thin films prepared by metallorganic chemical vapor deposition
Titanium dioxide thin films were deposited by Metallorganic Chemical Vapor Deposition at substrate temperatures ranging from 250 degrees C to 450 degrees C over soda lime glass and indium tin oxide coated glass substrates. X-ray diffraction studies show that films have a crystalline anatase structure at all the deposition temperatures. Particle size decreases and texture changes with the increase in substrate temperature. X-ray photoelectron spectroscopy confirms the appearance of a new well resolved state in the core level of Ti 2p spectrum shifted by 1.16 eV to lower binding energy due to the reduction of Ti+4 to Ti+3 upon litheation. Chronoamperometery, cyclic voltammetery and in situ UV-Vis spectrophotometeric studies were carried out on the prepared samples. Particle size and crystallinity control the electrochromic performance. The 350 degrees C film shows the highest ion storage capacity and the highest optical modulation along with an appreciable band gap broadening. (C) 2010 Elsevier B.V. All rights reserved.