Linear transparent zinc oxide films were fabricated using an inductively coupled microplasma jet generated in argon under atmospheric conditions. The films were formed by the sputtering and melting of a zinc filament placed inside the plasma. Film growth rates varied between 10 to 30 nm/s for input powers between 20 and 30 W. Film roughness below 20 nm and optical transmittances up to 90% in the visible were obtained while the sheet resistances ranged between 2 x 10(4) and 1 x 10(5)Omega/square. The presented technique may allow high-rate, localized, fabrication of functional ZnO films for optoelectronic applications. (C) 2010 Elsevier B.V. All rights reserved.