Fully strained low-temperature epitaxy of TiN/MgO(001) layers using high-flux, low-energy ion irradiation during reactive magnetron sputter deposition

Lee T; Seo H; Hwang H; Howe B; Kodambaka S; Greene JE; Petrov I

Thin Solid Films, Vol.518, No.18, 5169-5172, 2010

DOI10.1016/j.tsf.2010.04.028 Export Citation

Fully strained low-temperature epitaxy of TiN/MgO(001) layers using high-flux, low-energy ion irradiation during reactive magnetron sputter deposition

Lee T, Seo H, Hwang H, Howe B, Kodambaka S, Greene JE, Petrov I

Keywords:Epitaxy;Sputter deposition;Transition metal nitrides