Emission from Xe(2)* excimers exhibiting photon energies between 7 and 10 eV can be used to induce strong surface modification effects on polymeric materials in the top 100 nm layer. In order to identify suitable monomers for this VUV-based process, the photodegradation mechanism of different organosilanes of the general structure R-CH(2)-Si(OCH(3))(3) was elucidated by quantum chemical calculations. Herein, the photodegradation of 3-aminopropyltrimethoxysilane films by the use of a 172 nm excimer lamp under different irradiation conditions is described and completed by micropatterning experiments. The presence of 1000-5000 ppm oxygen was found to promote the transformation process to an inorganic-like surface. The films obtained were analyzed by X-ray photoelectron spectroscopy, contact angle measurements and fluorescence microscopy after covalent attachment of a fluorescent dye to the remaining amino groups. Complementary, silver staining was used to visualize photopatterning. (C) 2009 Elsevier B.V. All rights reserved.