In this paper a comparative study by means of a statistical analysis of the main process variables affecting ZnO crystal electrodeposition is presented. ZnO crystals were deposited on two different substrates, silicon wafer and indium tin oxide. The control variables were substrate types, electrolyte concentration, temperature, exposition time and current density. The morphologies of the different substrates were observed using scanning electron microscopy. The percentage of substrate area covered by ZnO deposit was calculated by computational image analysis. The design of the applied experiments was based on a two-level factorial analysis involving a series of 32 experiments and an analysis of variance. Statistical results reveal that variables exerting a significant influence on the area covered by ZnO deposit are electrolyte concentration, substrate type and time of deposition, together with a combined two-factor interaction between temperature and current density. However, morphology is also influenced by surface roughness of the substrates. (C) 2008 Elsevier B.V. All rights reserved.