Thin Solid Films, Vol.517, No.3, 1245-1250, 2008
Field emission properties of Ag/SiO2/carbon nanotube films by pulsed voltage co-electrophoretic deposition
In this study, the microstructure and field emission properties of the Ag/SiO2/carbon nanotube (CNT) films deposited by pulsed voltage and constant voltage were investigated. Multi-walled carbon nanotubes were suspended in a mixture of isopropyl alcohol and ethanol containing Ag and SiO2 powders. Polyethyleneimine and Disperbyk-184 were used its dispersants and surface charger for the CNTs and the suspended particles. The CNT/Ag/SiO2 films were prepared by electrochemical station using different waveforms utilizing pulsed or pulse-reversed plating. The results showed that the surface morphology of the composite Films prepared by pulse-reversed plating technique exhibited more homogeneity than those prepared by constant electric filed. In addition, pulsed voltage deposition technique was found to improve the uniformity of the film thickness. The carbon nanotube deposited by the pulsed voltage tended to align uniaxially in the direction of the applied external electric field. The pulsed plating parameters controlled by applying 35 V for 1 s and -0.1 V for 1 ms were found to be the optimum parameters for depositing samples that exhibited microstructures and possessed field emission properties. From the Field emission measurements, it was found that the Values for low turn-on field and that of threshold field were 1.25 V/mu m and 2.5 V/mu m respectively. The light emission by a diode-type display consisting of a phosphor-coated transparent-electrode showed that the phosphor luminescence image in 1 x 1 cm(2) possessed a strong, fine spot and uniform luminescence. (C) 2008 Elsevier B.V. All rights reserved.