Polymeric perfluorocarbon was deposited on the Si, Ag and Al substrates in Ar/c-C(4)F(8) plasmas under a deposition rate of 10 nm/h for seven hours. The X-ray photoelectron spectra and atomic force microscope images of the deposited materials were observed. As a result, it has been found that the surface structure and chemical bonding of the deposited materials are remarkably different from each other, depending on the kind of substrate. (c) 2007 Elsevier B.V. All rights reserved.