Large area VHF plasma production by a balanced power feeding method

Nishimiya T; Takeuchi Y; Yamauchi Y; Takatsuka H; Shioya T; Muta H; Kawai Y

Thin Solid Films, Vol.516, No.13, 4430-4434, 2008

DOI10.1016/j.tsf.2007.10.016 Export Citation

Large area VHF plasma production by a balanced power feeding method

Nishimiya T, Takeuchi Y, Yamauchi Y, Takatsuka H, Shioya T, Muta H, Kawai Y

We developed a VHF plasma source using a balanced power feeding method and investigated the characteristics of the VHF plasma with the Langmuir probe. It was found that the new VHF plasma source provides higher electron density plasma that is favorable for increasing the deposition rate, of microcrystalline silicon films. (c) 2007 Elsevier B.V. All rights reserved.

Keywords:solar cell;microcrystalline silicon;VHF plasma;langmuir probe;ion saturation current;electron temperature