Electrodeposition of ZnO thin films by using molecular oxygen and hydrogen peroxide as oxygen precursors: Structural and optical properties

Ramirez D; Silva D; Gomez H; Riveros G; Marotti RE; Dalchiele EA

Solar Energy Materials and Solar Cells, Vol.91, No.15-16, 1458-1461, 2007

DOI10.1016/j.solmat.2007.04.017 Export Citation

Electrodeposition of ZnO thin films by using molecular oxygen and hydrogen peroxide as oxygen precursors: Structural and optical properties

Ramirez D, Silva D, Gomez H, Riveros G, Marotti RE, Dalchiele EA

Zinc oxide thin films were potentiostatically electrodeposited from a ZnCl2+LiCl bath using two different oxygen precursors: molecular oxygen and hydrogen peroxide. X-ray diffraction (XRD) studies confirmed the presence of the ZnO wurtzite structure with marked preferential orientation along the (0 0 2) axis. The optical transmittance shows a clear absorption edge in the ultraviolet (UV) region which corresponds to an energy band gap of 3.41 +/- 0.03 eV. As a general rule the higher band gap energies are related to the more transparent films. (c) 2007 Elsevier B.V. All rights reserved.

Keywords:thin films;X-ray diffraction;optical transmittance;electrochemical deposition