Cold remote nitrogen plasma (CRNP) process is used to deposit organosiloxane polymeric films. 1,1,3,3-tetramethyldisiloxane (TMDS) or its mixture with oxygen is used to deposit polymeric layers on a rubber disks at ambient temperature. The deposited films appear to be efficient against chemical agents diffusion from the disks to a distilled water surrounding phase. The barrier efficiency is increased for films deposited from a TMDS/O-2 mixture. The extracted quantity of Zn++ after 30 days of immersion in distilled water at ambient temperature is 70% lower in comparison to the uncoated ones. The transfer of Zn++ into a liquid phase for coated disks is also discussed.