Multilayer X-ray optics with single layers of a few nanometers thickness can be obtained nowadays. These optics are used in X-ray diffractometers (XRD), X-ray fluorescence spectrometers (XRF) and at synchrotron sources. A detailed description of the production of multilayer X-ray optics using sputter deposition methods is presented and the simulation of X-ray optics and characterization with X-ray analytical measurements are explained. Finally, the advantages of multilayer X-ray optics in typical X-ray analytical applications are summarized.