화학공학소재연구정보센터
Plasma Chemistry and Plasma Processing, Vol.32, No.5, 1025-1038, 2012
Influence of Plasma Regimes and Catalysts on Ethanethiol Oxidation
Plasma oxidation of ethanethiol in air was investigated using three plasma regimes: surface dielectric pulsed corona discharge, surface dielectric barrier discharge and pulsed corona discharge (PCD) in the plasma reactor. Catalytic plasma degradation of ethanethiol was also performed on the singular or binary metals doped gamma-Al2O3. The ethanethiol removal rate increased with increasing energy density but energy efficiency was first increased and then decreased with increasing energy density under three various types of discharges. PCD plasma required the lowest energy density at the similar ethanethiol removal performance compared with the other two plasma discharges. The main intermediate by-products of ethanethiol oxidation by plasma are CH3CHO, HCHO, CO and CO2. The sum of these intermediate products selectivities is 19-43 %, implying that some other intermediates containing carbon were undetermined. When using PCD plasma combined with catalysts, ethanethiol removal rate and energy efficiency were all evidently improved. The maximum energy efficiency was achieved about 200 g kWh(-1) using Fe-Mn/gamma-Al2O3 assisted PCD plasma, which was about 4.4 times when using PCD plasma alone. The mechanism of ethanethiol oxidation is also discussed.