화학공학소재연구정보센터
Materials Research Bulletin, Vol.37, No.8, 1487-1497, 2002
Properties characterization of Ce(DPM)(4) served as precursor for MOCVD
High purity Ce(DPM)(4) (DPM = 2,2,6,6-tetramethyl-3,5-heptanedionato) powder was successfully synthesized from Ce(NO)(3) and HDPM followed by reduced pressure distillation and recrystallization from toluene. This metal -diketonate complex used as precursor for metal-organic chemical vapor deposition (MOCVD) of CeO2 film has been characterized by elemental analyses, X-ray diffraction (XRD), thermogravimetry-differential thermal analysis (TG-DTA) analysis, H-1-NMR spectroscopy, and infrared spectroscopy. The structure of this complex is monocline and the sublimation temperature is 145degreesC. This product was sufficiently stable after it was exposed to air for 30 days, as only a few impurities such as Ce-2(CO3)(3).8H(2)O, Ce(OH)(3), and H2O can be identified. Ce(DPM)(4) decomposes during evaporation, the chemical kbonds dissociate in the sequence of C-C(CH3)(3) > C-H > C-O and C-C by heating. At 280degreesC this complex thoroughly decomposes to CeO2. (C) 2002 Elsevier Science Ltd. All rights reserved.