Manufacturing of thin film transistor/liquid crystal display (TFT-LCD) involves a wide variety of specialty organic compounds, including dimethyl sulphoxide (DMSO) and other refractory organic compounds. Currently, the TFT-LCD wastewater is primarily treated by the conventional activated sludge process. However, biological treatment of this wastewater is handicapped by the low biodegradability of refractory organic compounds and generation of highly odorous gasses from biological decomposition of DMSO. To circumvent these problems, chemical pretreatment can provides a good alternative. In the present work, chemical oxidation of the plant wastewater obtained from a large TFT-LCD manufacturer by ozonation followed by biological treatment was attempted. The ozone oxidation of DMSO and other refractory organic compounds was conducted in a gas-induced reactor with or without addition of hydrogen peroxide (H2O2) and the biological treatment was carried out using a sequencing batch reactor (SBR). The performances of DMSO and COD (chemical oxygen demand) removal by ozonation and SBR processes were experimentally evaluated and optimum operating conditions identified. Test results indicated that.,complete DMSO removal and over 80% of COD removal could be achieved in less than 240 min in the gas-induced ozonation without odor associated with biological DMSO degradation. The SBR process was able to further lower the COD of the effluent from ozone reactor to the effluent standard (100 mg/L COD).