Electrodeposition of titanium was carried out in the K3TiF6-LiF-NaF-KF melt using both direct (DC) and unipolar pulse current (PC) techniques. Dense and smooth titanium coatings were obtained by PC plating at 750 degrees C whereas DC plating led to rough and dendritic deposits. The best results were obtained using a 100 mu C cm(-2) pulse charge and a cathodic current density of 50 and 75 mA cm(-2). The cathodic current efficiency was in the range 60-65%. The titanium deposits obtained under such conditions behaved similarly to CP-titanium in NaCl and HNO3 solutions at room temperature.