The effect of Ar+, N-2(+) and O-2(+) implantations on the electrochemical behaviour of electrodeposited zinc with and without chromate coatings has been studied. Cyclic voltammetry in deaerated 0.5 M sodium sulphate solution was used to provide information on the anodic dissolution properties of the specimens. It is shown the N-2(+) implantation on zinc forms an electrochemically inert surface layer. XPZ analysis has indicated zinc nitride formation in the N-2(+)-implanted layers. Ar+ and O-2(+) implantations enhance the anodic dissolution of zinc coatings. The higher current may be due to an increase in surface roughness due to the ion beam bombardment, as shown in the electron micrographs. Compact oxide layers could not be formed on zinc by oxygen implantation. It is established that O+ and N+ implantations are effective in improving the protective nature of chromate films and oxygen implantation has a stronger effect than the nitrogen implantation. After implantation into chromated zinc layers the reaction current is reduced considerably. It is shown that the implanted specimens maintain low anodic current with repeated potential sweeps. Chromate films become more compact after implantation this is supported by electron microscopy. Nitrogen is not detected in the N-2(+)-implanted chromated zinc electrodeposits. In contrast, Ar+ implantation causes destruction of the chromate films and the anodic dissolution current is enhanced.