The effects of RF fields on the reaction kinetics of urethane formation in the presence of a catalyst, ionic compounds or polar solvents were studied using ii? situ Raman spectroscopy. Kinetics simulations based on a simple second-order reaction model were used to verify the reaction mechanism. A maximum reaction rate of about 10% per second for urethane formation with 100 ppm NaCl, 25 ppm dibutylin diacetate, and 3.75 mol% DMSO was observed under an RF field of 6.3 kV/cm. The same reaction took more than 20 min to reach 60% conversion without the application of an RF field. However, the results of this work indicate that an intense RF field does not have a direct influence on the curing mechanism and kinetic parameters, although it has a very strong heating effect on the systems with ionic compounds and on the dielectric breakdown in the polar solvent vapor phase.