1 - 8 |
Three decades of molecular beam epitaxy Foxon CT |
9 - 16 |
Progress and prospects of advanced quantum nanostructures and roles of molecular beam epitaxy Sakaki H |
17 - 22 |
Speculations about future directions Kroemer H |
23 - 28 |
Theoretical study of In desorption and segregation kinetics in MBE growth of InGaAs and InGaN Stanley I, Coleiny G, Venkat R |
29 - 34 |
A simple model for MBE growth controlled by group III atom migration Holland MC |
35 - 39 |
Dynamics of spontaneous roughening on the GaAs(001)-(2 x 4) surface Ding Z, Bullock DW, Oliver WF, Thibado PM, LaBella VP |
40 - 45 |
Desorption process of GaAs surface native oxide controlled by direct Ga-beam irradiation Asaoka Y |
46 - 50 |
Ga-rich GaAs(001) surfaces observed by STM during high-temperature annealing in MBE Tsukamoto S, Pristovsek M, Ohtake A, Orr BG, Bell GR, Ohno T, Koguchi N |
51 - 55 |
Time-resolved X-ray diffraction study on surface structure and morphology during molecular-beam epitaxy growth Takahasi M, Yoneda Y, Inoue H, Yamamoto N, Mizuki J |
56 - 61 |
Island and pit kinetics on the growing GaAs (001) surface studied by synchrotron X-ray diffraction Braun W, Jenichen B, Kaganer VM, Shtukenberg AS, Daweritz L, Ploog KH |
62 - 67 |
Control of MBE surface step-edge kinetics to make an atomically smooth quantum well Yoshita M, Oh JW, Akiyama H, Pfeiffer LN, West KW |
68 - 72 |
Real-time surface composition and roughness analysis in MBE using RHEED-induced X-ray fluorescence Braun W, Ploog KH |
73 - 79 |
Accuracy of AlGaAs growth rates and composition determination using RHEED oscillations Harvey TE, Bertness KA, Hickernell RK, Wang CM, Splett JD |
80 - 84 |
V/III ratio dependence of surface migration length of As-4 molecules during molecular beam epitaxy of GaAsP on (411)A GaAs substrates Higuchi Y, Uemura M, Masui Y, Kitada T, Shimomura S, Hiyamizu S |
85 - 89 |
Mesoscopic island structure at GaAs /(AlGa)As interfaces grown by MBE Gottwaldt L, Pierz K, Ahlers FJ, Gobel EO, Nau S, Torunski T, Stolz W |
90 - 95 |
Characterization of interface roughness scattering of electrons in an In0.53Ga0.47As/In0.52Al0.48As QW-HEMT structure with (411)A super-flat interfaces Watanabe I, Kanzaki K, Kitada T, Yamamoto M, Shimomura S, Hiyamizu S |
96 - 100 |
Electronic properties of etched-regrown heterostructure interfaces Beyer S, Lohr S, Heyn C, Heitmann D, Hansen W |
IX - X |
Molecular Beam Epitaxy 2002 - Proceedings of the Twelfth International Conference on Molecular Beam Epitaxy, San Francisco, CA, USA, 15-20 September 2002 - Preface Harris JS, Miller DL, Tu CW |
101 - 105 |
Influence of indium segregation on the RHEED oscillations during the growth of InGaAs layers on a GaAs(001) surface Martini S, Quivy AA, Lamas TE, da Silva MJ, da Silva ECF, Leite JR |
106 - 111 |
Kinetics of dislocation-mediated strain relaxation in InGaAs/GaAs heteroepitaxy Beresford R, Lynch C, Chason E |
112 - 117 |
Interplay between relaxation, surface morphology and composition modulation in InAlAs graded buffer layers Chauveau JM, Cordier Y, Kim HJ, Ferre D, Androussi Y, Di Persio J |
118 - 123 |
Effects of noise level in fitting in situ optical reflectance spectroscopy data Fu CC, Bertness KA, Wang CM |
124 - 129 |
InGaAs composition monitoring for production MBE by in situ optical-based flux monitor (OFM) Pinsukanjana PR, Marquis JM, Hubbard J, Trivedi MA, Dickey RF, Tsai JMS, Kuo SP, Kao PS, Kao YC |
130 - 134 |
Multiwafer gas source MBE development for InGaAsP/InP laser production Lelarge F, Sanchez JJ, Gaborit F, Gentner JL |
135 - 139 |
Low-temperature growth of self-assembled InAs dots on GaAs by molecular beam epitaxy Zhan HH, Notzel R, Hamhuis GJ, Eijkemans TJ, Wolter JH |
140 - 144 |
Ga/In-intermixing and segregation during InAs quantum dot formation Heyn C, Hansen W |
145 - 149 |
Influence of initial GaAs and A1As cap layers on InAs quantum dots grown by molecular beam epitaxy Ferdos F, Wang SM, Wei YQ, Sadeghi M, Zhao QX, Larsson A |
150 - 154 |
Strain-driven (In,Ga)As growth instability on GaAs (311)A and (311)B: self-organization of template for InAs quantum dot nucleation control Gong Q, Notzel R, Wolter JH |
155 - 160 |
Controlling the shape of InAs self-assembled quantum dots by thin GaAs capping layers Takehana K, Pulizzi F, Patane A, Henini M, Main PC, Eaves L, Granados D, Garcia JM |
161 - 165 |
Scanning tunneling microscopy study of GaAs overgrowth on InAs islands formed on GaAs(001) Hasegawa S, Suekane O, Takata M, Nakashima H |
166 - 171 |
Photoluminescence investigation of low-temperature, capped self-assembled InAs/GaAs quantum-dots Songmuang R, Kiravittaya S, Sawadsaringkarn M, Panyakeow S, Schmidt OG |
172 - 176 |
Aluminium incorporation for growth optimization of 1.3 mu m emission InAs/GaAs quantum dots by molecular beam epitaxy Wei YQ, Wang SM, Ferdos F, Vukusic J, Zhao QX, Sadeghi M, Larsson A |
177 - 180 |
Effect of annealing on the structure and optical properties of InGaAs/GaAs quantum dots Xu ZC, Leosson K, Birkedal D, Hvam JM, Sadowski I, Zhao ZY, Chen XS, Liu YM, Yang KT |
181 - 185 |
Optical response at 1.3 mu m and 1.5 mu m with InAs quantum dots embedded in a pure GaAs matrix da Silva MJ, Quivy AA, Martini S, Lamas TE, da Silva ECF, Leite JR |
186 - 191 |
Magneto-photoluminescence studies of the influence of substrate orientation on the growth of InAs/GaAs quantum dots Maes J, Henini M, Hayne M, Patane A, Pulizzi F, Eaves L, Main PC, Moshchalkov VV |
192 - 195 |
Emission energy and polarization tuning of InAs/GaAs self-assembled quantum dots by growth interruption Ochoa D, Polimeni A, Capizzi M, Patane A, Henini M, Eaves L, Main PC |
196 - 200 |
Observation of blue-shifted photoluminescence in stacked InAs/GaAs quantum dots Somintac A, Estacio E, Salvador A |
201 - 207 |
Growth of self-assembled InAs quantum dots on Si exposed GaAs substrates by molecular beam epitaxy Saucedo-Zeni N, Zamora-Peredo L, Gorbatchev AY, Lastras-Martinez A, Balderas-Navarro R, Medel-Ruiz CI, Mendez-Garcia VH |
208 - 212 |
Characteristics of InAs "dots-in-a-graded-well" Chen L, Pal D, Towe E |
213 - 217 |
Customized nanostructures MBE growth: from quantum dots to quantum rings Granados D, Garcia JM |
218 - 222 |
Desorption of InAs quantum dots Heyn C, Hansen W |
223 - 229 |
Growth and temperature characteristic of self-assembled InAs-QD on GaInP Amanai H, Nagao S, Sakaki H |
230 - 235 |
Growth and optical characterizations of InAs quantum dots on InP substrate: towards a 1.55 mu m quantum dot laser Paranthoen C, Platz C, Moreau G, Bertru N, Dehaese O, Le Corre A, Miska P, Even J, Folliot H, Labbe C, Patriarche G, Simon JC, Loualiche S |
236 - 242 |
Study of the GaAs growth on pseudomorphic Si layers for the formation of self-assembled quantum dots Perez-Centeno A, Mendez-Garcia VH, Zamora-Peredo L, Saucedo-Zeni N, Lopez-Lopez M |
243 - 247 |
Growth and microstructure of semimetallic ErAs particles embedded in an In0.53Ga0.47As matrix Driscoll DC, Hanson MP, Mueller E, Gossard AC |
248 - 252 |
Epitaxial growth of 1.55 mu m emitting InAs quantum dashes on InP-based heterostructures by GS-MBE for long-wavelength laser applications Schwertberger R, Gold D, Reithmaier JP, Forchel A |
253 - 257 |
Molecular beam epitaxial growth studies of ordered GaAs nanodot arrays using anodic alumina masks Mei XY, Blumin M, Kim D, Wu ZH, Ruda HE |
258 - 263 |
Self-assembled nanoholes and lateral QD bi-molecules by molecular beam epitaxy and atomically precise in situ etching Kiravittaya S, Songmuang R, Jin-Phillipp NY, Panyakeow S, Schmidt OG |
264 - 268 |
Role of In desorption for formation of self-organized (In,Ga)As quantum wires on GaAs(100) during superlattice formation Mano T, Notzel R, Hamhuis GJ, Eijkemans TJ, Wolter JH |
269 - 275 |
Improved uniformity of self-organized In0.53Ga0.47As/In0.52Al0.48As quantum wires grown on (775)B-oriented InP substrate by molecular beam epitaxy Ohno Y, Shimomura S, Hiyamizu S |
276 - 280 |
Formation of nano-oxide regions in p(2+)-GaAs epilayers by localized atomic force microscope probe oxidation for fabrication of nano-structure devices Matsuzaki Y, Ota N, Yamada A, Sandhu A, Konagai M |
281 - 284 |
Application of multi-step formation during molecular beam epitaxy for fabricating novel nanomechanical structures Yamaguchi H, Hirayama Y |
285 - 291 |
Molecular beam epitaxy and properties of ferromagnetic III-V semiconductors Ohno H |
292 - 296 |
Growth and properties of ferromagnet-semiconductor heterostructures for spin injection at room temperature Ploog KH, Herfort J, Schonherr HP, Moreno M, Dhar S |
297 - 302 |
Structural and magnetic order in MnAs films grown by molecular beam epitaxy on GaAs for spin injection Daweritz L, Kastner M, Hesjedal T, Plake T, Jenichen B, Ploog KH |
303 - 310 |
MBE growth, structural, and transport properties of Mn delta-doped GaAs layers Nazmul AM, Sugahara S, Tanaka M |
311 - 316 |
The growth of GaMnAs films by molecular beam epitaxy using arsenic dimers Campion RP, Edmonds KW, Zhao LX, Wang KY, Foxon CT, Gallagher BL, Staddon CR |
317 - 322 |
Epitaxial growth and magnetic properties of single-crystal MnAs/AlAs/MnAs magnetic tunnel junctions on exact (111)B GaAs substrates: the effect of ultrathin GaAs buffer layers Sugahara S, Tanaka M |
323 - 326 |
Growth of the half-Heusler alloy NiMnSb on (In,Ga)As/InP by molecular beam epitaxy Bach P, Ruster C, Gould C, Becker CR, Schmidt G, Molenkamp LW |
327 - 330 |
MBE growth and properties of GaCrN Hashimoto M, Zhou YK, Kanamura M, Katayama-Yoshida H, Asahi H |
331 - 336 |
MBE growth of GaMnN diluted magnetic semiconductors and its magnetic properties Chen PP, Makino H, Kim JJ, Yao T |
337 - 341 |
Spin injection from a ferromagnetic electrode into InAs surface inversion layer Yoh K, Ohno H, Katano Y, Mukasa K, Ramsteiner M |
342 - 346 |
New structures for carrier-controlled ferromagnetism in Cd1-xMnxTe quantum wells Bertolini M, Maslana W, Boukari H, Gilles B, Cibert J, Ferrand D, Tatarenko S, Kossacki P, Gaj JA |
347 - 352 |
Molecular beam epitaxial growth of CdMnSe on InAs and AlGaSb Grabs P, Slobodskyy A, Richter G, Fiederling R, Gould C, Becker CR, Schmidt G, Molenkamp LW |
353 - 359 |
GaInNAs for GaAs based lasers for the 1.3 to 1.5 mu m range Fischer M, Gollub D, Reinhardt M, Kamp M, Forchel A |
360 - 366 |
The role of Sb in the MBE growth of (GaIn)(NAsSb) Volz K, Gambin V, Ha W, Wistey MA, Yuen H, Bank S, Harris JS |
367 - 371 |
1.5 mu m GaInNAs(Sb) lasers grown on GaAs by MBE Bank S, Ha W, Gambin V, Wistey M, Yuen H, Goddard L, Kim S, Harris JS |
372 - 377 |
Growth characteristics of GaInNAs/GaAs quantum dots by chemical beam epitaxy Makino S, Miyamoto T, Ohta M, Kageyama T, Ikenaga Y, Koyama F, Iga K |
378 - 382 |
A study and control of lattice sites of N and In/Ga interdiffusion in dilute nitride quantum wells Peng CS, Li W, Jouhti T, Pavelescu EM, Pessa M |
383 - 387 |
Correlations between structural and optical properties of GaInNAs quantum wells grown by MBE Chauveau JM, Trampert A, Pinault MA, Tournie E, Du K, Ploog KH |
388 - 391 |
InAs/InGaAsN quantum dots emitting at 1.55 mu m grown by molecular beam epitaxy Ustinov VM, Egorov AY, Odnoblyudov VA, Kryzhanovskaya NV, Musikhin YG, Tsatsul'nikov AF, Alferov ZI |
392 - 398 |
A comparison of MBE- and MOCVD-grown GaInNAs Ptak AJ, Johnston SW, Kurtz S, Friedman DJ, Metzger WK |
399 - 402 |
Thickness dependent roughening of Ga(As,N)/GaAs MQW structures with high nitrogen content Mussler G, Daweritz L, Ploog KH |
403 - 407 |
Comparison of GaInNAs/GaAs and GaInNAs/GaNAs/GaAs quantum wells emitting over 1.3 mu m wavelength Li LH, Patriarche G, Lemaitre A, Largeau L, Travers L, Harmand JC |
408 - 411 |
Structural changes on annealing of MBE grown (Ga, In) (N, As) as measured by X-ray absorption fine structure Gambin V, Lordi V, Ha W, Wistey M, Takizawa T, Uno K, Friedrich S, Harris J |
412 - 416 |
Growth of GaInNAs by atomic hydrogen-assisted RF-MBE Ohmae A, Matsumoto N, Okada Y |
417 - 421 |
Valence band structure of GaAsN compounds and band-edge lineup in GaAs/GaAsN/InGaAs heterostructures Egorov AY, Odnobludov VA, Mamutin VV, Zhukov AE, Tsatsul'nikov AF, Kryzhanovskaya NV, Ustinov VM, Hong YG, Tu CW |
422 - 426 |
RF-MBE growth of InAsN layers on GaAs (001) substrates using a thick InAs buffer layer Nishio S, Nishikawa A, Katayama R, Onabe K, Shiraki Y |
427 - 431 |
MBE growth and photoreflectance study of GaAsN alloy films grown on GaAs (001) Nishikawa A, Katayama R, Onabe K, Shiraki Y |
432 - 436 |
MBE development of dilute nitrides for commercial long-wavelength laser applications Malis O, Liu WK, Gmachl C, Fastenau JM, Joel A, Gong P, Bland SW, Moshegov N |
437 - 442 |
Growth and characterization of GaInNP grown on GaAs substrates Hong YG, Juang FS, Kim MH, Tu CW |
443 - 448 |
Improvement of crystalline quality of GaAsyP1-x-yNx layers with high nitrogen compositions at low-temperature growth by atomic hydrogen irradiation Momose K, Yonezu H, Furukawa Y, Utsumi A, Yoshizumi Y, Shinohara S |
449 - 454 |
Surfactant enhanced growth of GaNAs and InGaNAs using bismuth Tixier S, Adamcyk M, Young EC, Schmid JH, Tiedje T |
455 - 459 |
Improvement of cubic GaN film crystal quality by use of an AlN/GaN ordered alloy on GaAs (100) by plasma assisted molecular beam epitaxy Kimura R, Shigemori A, Shike J, Ishida K, Takahashi K |
460 - 464 |
Control of the polarity of GaN films using an Mg adsorption layer Grandjean N, Dussaigne A, Pezzagna S, Vennegues P |
465 - 470 |
Single-crystal zincblende GaN grown on GaP (100) substrate by molecular beam epitaxy Kim MH, Juang FS, Hong YG, Tu CW, Park SJ |
471 - 475 |
In surface segregation in InGaN/GaN quantum wells Dussaigne A, Damilano B, Grandjean N, Massies J |
476 - 480 |
Plasma-assisted MBE growth of quaternary InAlGaN quantum well heterostructures with room temperature luminescence Dimakis E, Georgakilas A, Androulidaki M, Tsagaraki K, Kittler G, Kalaitzakis F, Cengher D, Bellet-Amalric E, Jalabert D, Pelekanos NT |
481 - 486 |
Molecular beam epitaxy of beryllium-doped GaN buffer layers for AlGaN/GaN HEMTs Katzer DS, Storm DF, Binari SC, Roussos JA, Shanabrook BV, Glaser ER |
487 - 493 |
Comparative study of GaN/AlGaN MQWs grown homoepitaxially on (1(1)over-bar-00) and (0001) GaN Bhattacharyya A, Friel I, Iyer S, Chen TC, Li W, Cabalu J, Fedyunin Y, Ludwig KF, Moustakas TD, Maruska HP, Hill DW, Gallagher JJ, Chou MC, Chai B |
494 - 498 |
Plasma-assisted MBE growth of InN films and InAlN/InN heterostructures Higashiwaki M, Matsui T |
499 - 504 |
MOMBE growth studies of GaN using metalorganic sources and nitrogen Li T, Campion RP, Foxon CT, Rushworth SA, Smith LM |
505 - 509 |
Nucleation and growth of GaN observed by in situ line-of-sight mass spectrometry Averbeck R, Koblmueller G, Riechert H, Pongratz P |
510 - 514 |
Arsenic incorporation in GaN during growth by molecular beam epitaxy Foxon CT, Novikov SV, Li T, Campion RP, Winser AJ, Harrison I, Kappers MJ, Humphreys CJ |
515 - 520 |
Digital alloy growth in mixed As/Sb heterostructures Kaspi R, Donati GP |
521 - 525 |
GaAsSb/GaAs band alignment evaluation for long-wave photonic applications Johnson SR, Guo CZ, Chaparro S, Sadofyev YG, Wang J, Cao Y, Samal N, Xu J, Yu SQ, Ding D, Zhang YH |
526 - 531 |
Investigation of a growth interruption under an As flux at AlSb/InAs interfaces with InSb bonds Sigmund J, Karova K, Miehe G, Saglam M, Hartnagel HL, Fuess H |
532 - 537 |
Controlled n-type doping of antimonides and arsenides using GaTe Bennett BR, Magno R, Papanicolaou N |
538 - 542 |
MBE growth and photoluminescence properties of strained InAsSb/AlSbAs quantum wells Solov'ev VA, Terent'ev YV, Toropov AA, Mel'tser BY, Semenov AN, Ivanov SV, Kop'ev PS, Meyer JR |
543 - 546 |
Reduction of the unintentional background electron density in AlSb/InAs/AlSb quantum wells Kadow C, Lin HK, Dahlstrom M, Rodwell M, Gossard AC, Brar B, Sullivan G |
547 - 550 |
Structure stability of short-period InAs/AlSb superlattices Xu DP, Litvinchuk AP, Wang X, Delaney A, Le H, Pei SS |
551 - 555 |
Anisotropic structural and electronic properties of InSb/AlxIn1-xSb quantum wells grown on GaAs (001) substrates Mishima TD, Keay JC, Goel N, Ball MA, Chung SJ, Johnson MB, Santos MB |
556 - 559 |
InAs/AlGaSb heterostructure displacement sensors for MEMS/NEMS applications Yamaguchi H, Miyashita S, Hirayama Y |
560 - 564 |
Transport properties of Sn-doped InSb thin films and applications to Hall element Okamoto A, Shibasaki I |
565 - 570 |
Characterization of MBE grown II-VI semiconductor thin layers by X-ray interference Prior KA, Tang X, O'Donnell C, Bradford C, David L, Cavenett BC |
571 - 575 |
Accuracy of the in situ determination of the CdZnTe temperature by ellipsometry before the growth of HgCdTe by MBE Badano G, Garland JW, Sivananthan S |
576 - 580 |
PL characteristics of MBE-grown, Pb-doped ZnSe crystal layers Mita Y, Kuronuma R, Sasaki S, Inoue M, Maruyama S |
581 - 585 |
Growth and characterization of MgS/CdSe self-assembled quantum dots Bradford C, Urbaszek B, Funato M, Graham TCM, McGhee EJ, Warburton RJ, Prior KA, Cavenett B |
586 - 590 |
Growth and characterization of CdSe : Mn quantum dots Tang X, Urbaszek B, Graham TCM, Warburton RJ, Prior KA, Cavenett BC |
591 - 595 |
Growth of zinc blende MnS and MnS heterostructures by MBE using ZnS as a sulfur source David L, Bradford C, Tang X, Graham TCM, Prior KA, Cavenett BC |
596 - 601 |
High quality ZnTe heteroepitaxy layers using low-temperature buffer layers Chang JH, Godo K, Song JS, Oh D, Lee C, Yao T |
602 - 606 |
Growth conditions in molecular beam epitaxy for controlling CdSeTe epilayer composition Matsumura N, Sakamoto T, Saraie J |
607 - 611 |
Electrical properties of heavily Al-doped ZnSe grown by molecular beam epitaxy Oh DC, Chang JH, Takai T, Song JS, Godo K, Park YK, Shindo K, Yao T |
612 - 618 |
Strong luminescence due to localized excitons in CdTe/ZnSe fractional monolayer structures Chang JH, Takai T, Godo K, Makino H, Goto T, Yao T |
619 - 622 |
MBE growth and characterization of A-site deficient, low-field magnetoresistance (Pr1-xSrx)(y)MnO3-delta oriented thin films Liu GJ, Feng YH, Wang HM, Makino H, Hanada T, Yao T |
623 - 627 |
ZnO and ZnMgO growth on a-plane sapphire by molecular beam epitaxy Ogata K, Koike K, Tanite T, Komuro T, Yan F, Sasa S, Inoue M, Yano M |
628 - 632 |
Doping effects in ZnO layers using Li3N as a doping source Ko HJ, Chen YF, Hong SK, Yao T |
633 - 637 |
Natural ordering of ZnO1-xSex grown by radical. source MBE Iwata K, Yamada A, Fons P, Matsubara K, Niki S |
638 - 644 |
Development of integrated hetero structures on silicon by MBE Droopad R, Yu ZY, Li H, Liang Y, Overgaard C, Demkov A, Zhang XD, Moore K, Eisenbeiser K, Hu M, Curless J, Finder J |
645 - 650 |
Advances in high kappa gate dielectrics for Si and III-V semiconductors Kwo J, Hong M, Busch B, Muller DA, Chabal YJ, Kortan AR, Mannaerts JP, Yang B, Ye P, Gossmann H, Sergent AM, Ng KK, Bude J, Schulte WH, Garfunkel E, Gustafsson T |
651 - 656 |
Heavy arsenic doping of silicon by molecular beam epitaxy Liu X, Tang Q, Kamins TI, Harris JS |
657 - 661 |
Ordered arrays of rare-earth silicide nanowires on Si(001) Ragan R, Chen Y, Ohlberg DAA, Medeiros-Ribeiro G, Williams RS |
662 - 665 |
Nucleation of Ti-catalyzed self-assembled kinked Si nanowires grown by gas source MBE Tang Q, Liu X, Kamins TI, Solomon GS, Harris JS |
666 - 669 |
Critical thickness of self-assembled Ge quantum dot superlattices Liu JL, Wan J, Wang KL, Yu DP |
670 - 675 |
Growth of SiGe/Ge/SiGe heterostructures with ultrahigh hole mobility and their device application Irisawa T, Koh S, Nakagawa K, Shiraki Y |
676 - 680 |
Dynamics and surface segregation during GSMBE of Si1-yCy and Si1-x-yGexCy on the Si(001) surface Price RW, Tok ES, Liu R, Wee ATS, Woods NJ, Zhang J |
681 - 684 |
Characterization of epitaxial Si1-yCy layers on Si(001) grown by gas-source molecular beam epitaxy Abe K, Yamada A, Konagai M |
685 - 688 |
Relaxation enhancement of SiGe thin layers by ion implantation into Si substrates Sawano K, Hirose Y, Koh S, Nakagawa K, Hattori T, Shiraki Y |
689 - 692 |
Hole transport properties of B-doped relaxed SiGe epitaxial films grown by molecular beam epitaxy Koh S, Murata K, Irisawa T, Nakagawa K, Shiraki Y |
693 - 696 |
Planarization of SiGe virtual substrates by CMP and its application to strained Si modulation-doped structures Sawano K, Arimoto K, Hirose Y, Koh S, Usami N, Nakagawa K, Hattori T, Shiraki Y |
697 - 700 |
Continuous wave operation of quantum cascade lasers Beck M, Hofstetter D, Aellen T, Blaser S, Faist J, Oesterle U, Gini E |
701 - 706 |
Thermal behavior of GaAs/AlGaAs quantum-cascade lasers: effect of the Al content in the barrier layers Ortiz V, Becker C, Page H, Sirtori C |
707 - 717 |
Strain compensated Si/Si0.2Ge0.8 quantum cascade structures grown by low temperature molecular beam epitaxy Grutzmacher D, Mentese S, Muller E, Diehl L, Sigg H, Campidelli Y, Kermarrec O, Bensahel D, Roch T, Stangl J, Bauer G |
718 - 722 |
InAs-based quantum cascade light emitting structures containing a double plasmon waveguide Ohtani K, Sakuma H, Ohno H |
723 - 728 |
Material engineering for InAs/GaSb/AlSb quantum cascade light emitting devices Marcadet X, Becker C, Garcia M, Prevot I, Renard C, Sirtori C |
729 - 736 |
InAs/InGaAs/GaAs quantum dot lasers of 1.3 mu m range with enhanced optical gain Kovsh AR, Maleev NA, Zhukov AE, Mikhrin SS, Vasil'ev AP, Semenova EA, Shernyakov YM, Maximov MV, Livshits DA, Ustinov VM, Ledentsov NN, Bimberg D, Alferov ZI |
737 - 741 |
Tuning the single optical mode spontaneous emission coupling of a quantum dot in a micropost cavity Solomon GS, Pelton M, Yamamoto Y |
742 - 747 |
Improved performance of MBE grown quantum-dot lasers with asymmetric dots in a well design emitting near 1.3 mu m Krebs R, Deubert S, Reithmaier JP, Forchel A |
748 - 753 |
InP-based VCSEL technology covering the wavelength range from 1.3 to 2.0 mu m Boehm G, Ortsiefer M, Shau R, Rosskopf J, Lauer C, Maute M, Kohler F, Mederer F, Meyer R, Amann MC |
754 - 759 |
Fabrication of GaAs laser diodes on Si using low-temperature bonding of MBE-grown GaAs wafers with Si wafers Cengher D, Hatzopoulos Z, Gallis S, Deligeorgis G, Aperathitis E, Androulidaki M, Alexe M, Dragoi V, Kyriakis-Bitzaros ED, Halkias G, Georgakilas A |
760 - 765 |
A forbidden temperature region for the growth of planar strained InAlGaAs MQW structures for 1.3 mu m lasers SpringThorpe AJ, Extavour M, Goodchild D, Griswold EM, Smith G, White JK, Hinzer K, Glew R, Williams R, Robert F |
766 - 770 |
Lattice-matched Al0.95Ga0.05AsSb oxide for current confinement in InP-based long wavelength VCSELs Reddy MHM, Buell DA, Asano T, Koda R, Feezell D, Huntington AS, Coldren LA |
771 - 776 |
Room temperature 1.3 mu m emission from self-assembled GaSb/GaAs quantum dots Farrer I, Murphy MJ, Ritchie DA, Shields AJ |
777 - 781 |
Experimental extract and empirical formulas of refractive indices of GaAs and AlAs at high temperature by HRXRD and optical reflectivity measurement Zhang BY, Solomon G, Weihs G, Yamamoto Y |
782 - 786 |
The effects of (NH4)(2)S passivation treatments on the dark current-voltage characteristics of InGaAsSb PIN detectors Zhang X, Li AZ, Lin C, Zheng YL, Xu GY, Qi M, Zhang YG |
787 - 793 |
Normal incidence InAs/InGaAs dots-in-well detectors with current blocking AlGaAs layer Rotella P, Raghavan S, Stintz A, Fuchs B, Krishna S, Morath C, Le D, Kennerly SW |
794 - 799 |
Template design and fabrication for low-loss orientation-patterned nonlinear AlGaAs waveguides pumped at 1.55 mu m Yu X, Scaccabarozzi L, Levi O, Pinguet TJ, Fejer MM, Harris S |
800 - 803 |
Gas source MBE growth of TlInGaAs/InP laser diodes and their room temperature operation Lee HJ, Fujiwara A, Imada A, Asahi H |
804 - 810 |
Properties of metamorphic materials and device structures on GaAs substrates Hoke WE, Kennedy TD, Torabi A, Whelan CS, Marsh PF, Leoni RE, Lardizabal SM, Zhang Y, Jang JH, Adesida I, Xu C, Hsieh KC |
811 - 815 |
MBE growth of AlGaN/GaN HEMTS on resistive Si(111) substrate with RF small signal and power performances Cordier Y, Semond F, Lorenzini P, Grandjean N, Natali F, Damilano B, Massies J, Hoel V, Minko A, Vellas N, Gaquiere C, DeJaeger JC, Dessertene B, Cassette S, Surrugue M, Adam D, Grattepain JC, Aubry R, Delage SL |
816 - 821 |
High-performance enhancement-mode pseudomorphic InGaP/InGaAs/GaAs HEMT structures by gas source molecular beam epitaxy Li AZ, Chen YQ, Chen JX, Qi M, Liu XC, Chen J, Wang RM, Wang WL, Li WX |
822 - 826 |
Influence of MBE growth conditions on the quality of InAlAs/InGaAs metamorphic HEMTs on GaAs Cordier Y, Lorenzini P, Chauveau JM, Ferre D, Androussi Y, DiPersio J, Vignaud D, Codron JL |
827 - 831 |
High indium metamorphic HEMT on a GaAs substrate Hoke WE, Kennedy TD, Torabi A, Whelan CS, Marsh PF, Leoni RE, Xu C, Hsieh KC |
832 - 836 |
Growth of shallow InAs HEMTs with metamorphic buffer Heyn C, Mendach S, Lohr S, Beyer S, Schnull S, Hansen W |
837 - 842 |
Impact of metal/oxide interface on DC and RF performance of depletion-mode GaAs MOSFET employing MBE grown Ga2O3(Gd2O3) as gate dielectric Yang B, Ye PD, Kwo J, Frei MR, Gossmann HJL, Mannaerts JP, Sergent M, Hong M, Bude KNJ |
843 - 847 |
V-grooved InGaAs quantum-wire FET fabricated under an As-2 flux in molecular-beam epitaxy Sugaya T, Jang KY, Wada T, Sato A, Ogura M, Komori K |
848 - 851 |
Molecular beam epitaxial growth and characterization of InP/GaAsSb/InP double heterojunction bipolar transistors Rajavel RD, Hussain T, Montes MC, Sawins MW, Thomas S, Chow DH |
852 - 857 |
Low-voltage InAsP/InAs HBT and metamorphic InAs BJT devices grown by molecular beam epitaxy Averett KL, Wu X, Koch MW, Wicks GW |