171 - 175 |
Electronic structure and interband optical properties of beta-FeSi2 Lange H |
176 - 182 |
Calculation of electronic energy and density of state of iron-disilicides using a total-energy pseudopotential method, CASTEP Imai Y, Mukaida M, Tsunoda T |
183 - 187 |
Electronic structure of beta-FeSi2 modified by r.f.-plasma of semiconducting SiH4, GeH4 gas Matsubara K, Nagao K, Kishimoto K, Anno H, Koyanagi T |
188 - 193 |
Ion beam synthesized silicides: growth, characterization and devices Homewood KP, Reeson KJ, Gwilliam RM, Kewell AK, Lourenco MA, Shao G, Chen YL, Sharpe JS, McKinty CN, Butler T |
194 - 201 |
Study of structure and optical properties of beta-FeSi2 precipitates formed by ion-implantation of Fe+ in Si(100) and effects of co-implantation of Fe+ and Si+ in amorphous SiO2 Oyoshi K, Lenssen D, Carius R, Mantl S |
202 - 208 |
Formation of beta-FeSi2 precipitates at the SiO2/Si interface by Fe+ ion implantation and their structural and optical properties Oyoshi K, Lenssen D, Carius R, Mantl S |
209 - 213 |
Dependence of photoluminescence from beta-FeSi2 and induced deep levels in Si on the size of beta-FeSi2 balls embedded in Si crystals Suemasu T, Fujii T, Takakura K, Hasegawa F |
214 - 218 |
Preparation of beta-FeSi2 films by chemical vapor deposition Mukaida M, Hiyama I, Tsunoda T, Imai Y |
219 - 224 |
Raman spectroscopic study of ion-beam synthesized polycrystalline beta-FeSi2 on Si(100) Maeda Y, Umezawa K, Hayashi Y, Miyake K |
225 - 230 |
Microstructure characterization of ion-beam synthesized beta-FeSi2 phase by transmission electron microscopy Sugiyama M, Maeda Y |
231 - 235 |
Microstructure of semiconducting MnSi1.7 and beta-FeSi2 layers grown by surfactant-mediated reactive deposition epitaxy Tatsuoka H, Koga T, Matsuda K, Nose Y, Souno Y, Kuwabara H, Brown PD, Humphreys CJ |
236 - 243 |
Microstructure of beta-FeSi2 thin films prepared by pulsed laser deposition Yoshitake T, Nagamoto T, Nagayama K |
244 - 250 |
Fabrication of heterostructure p-beta-Fe0.95Mn0.05Si2/n-Si diodes by Fe+ and Mn+ co-implantation in Si(100) substrates Katsumata H, Makita Y, Takada T, Tanoue H, Kobayashi N, Hasegawa M, Kakemoto H, Tsukamoto T, Uekusa S |
251 - 255 |
Small polaron of beta-FeSi2 obtained from optical measurements Kakemoto H, Makita Y, Kino Y, Sakuragi S, Tsukamoto T |
256 - 261 |
Photovoltaic properties of ion-beam synthesized beta-FeSi2/n-Si heterojunctions Maeda Y, Umezawa K, Hayashi Y, Miyake K, Ohashi K |
262 - 266 |
Electrical and photovoltaic properties of iron-silicide/silicon heterostructures formed by pulsed laser deposition Liu ZX, Watanabe M, Hanabusa M |
267 - 275 |
Spectral sensitivity enhancement by thin film of beta-FeSi2-Si composite prepared by RF-sputtering deposition Okajima K, Yamatsugu H, Wen C, Sudoh M, Yamada K |
276 - 281 |
Single crystal growth of non-stoichiometric beta-FeSi2 by chemical transport reaction Behr G, Ivanenko L, Vinzelberg H, Heinrich A |
282 - 286 |
Transport properties of Cr-doped beta-FeSi2 Arushanov E, Schon JH, Lange H |
287 - 295 |
Thermoelectric properties of beta-FeSi2 single crystals and polycrystalline beta-FeSi2+x thin films Heinrich A, Griessmann H, Behr G, Ivanenko K, Schumann J, Vinzelberg H |
296 - 302 |
Thermoelectric properties of Ru- or Ge-doped beta-FeSi2 films prepared by electron beam deposition Tsunoda T, Mukaida M, Imai Y |
VII - VII |
Special issue on silicide kankyo semiconductors - Ecologically friendly semiconductors - Optoelectronic and energy research for next generation - Preface Miyake K, Makita Y, Maeda Y, Suemasu T |