3713 - 3713 |
Special Issue: 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics (TOEO-7) Preface Ginley D, Kamiya T, Shigesato Y, Hosono H |
3714 - 3720 |
Advances in understanding of transparent conducting oxides Robertson J, Gillen R, Clark SJ |
3721 - 3728 |
Energy band alignment at interfaces of semiconducting oxides: A review of experimental determination using photoelectron spectroscopy and comparison with theoretical predictions by the electron affinity rule, charge neutrality levels, and the common anion rule Klein A |
3729 - 3735 |
Rapid thermal annealing of sputter-deposited ZnO/ZnO:N/ZnO multilayered structures Watanabe F, Shirai H, Fujii Y, Hanajiri T |
3736 - 3740 |
Low-temperature deposition of crystallized TiO2 thin films Yasuda Y, Kamikuri K, Tobisaka M, Hoshi Y |
3741 - 3745 |
The electrical and optical properties of indium zinc tin oxide thin films with different Sn/Zn ratio Damisih, Ma HC, Kim JJ, Lee HY |
3746 - 3750 |
High-rate deposition of Ta-doped SnO2 films by reactive magnetron sputtering using a Sn-Ta metal-sintered target Muto Y, Nakatomi S, Oka N, Iwabuchi Y, Kotsubo H, Shigesato Y |
3751 - 3754 |
In-situ analyses on the reactive sputtering process to deposit Al-doped ZnO films using an Al-Zn alloy target Tsukamoto N, Oka N, Shigesato Y |
3755 - 3759 |
Optical and electrical properties of heat-resistant Sb-doped Sn1-xHfxO2 transparent conducting films Ueda K, Kishigawa Y, Takano Y |
3760 - 3763 |
Ti-doped Gd2O3 sensing membrane for electrolyte-insulator-semiconductor pH sensor Kao CH, Wang JC, Lai CS, Huang CY, Ou JC, Wang HY |
3764 - 3768 |
Amorphous structure and electrical performance of low-temperature annealed amorphous indium zinc oxide transparent thin film transistors Lee S, Bierig B, Paine DC |
3769 - 3773 |
The effect of metallization contact resistance on the measurement of the field effect mobility of long-channel unannealed amorphous In-Zn-O thin film transistors Lee S, Park H, Paine DC |
3774 - 3777 |
Threshold voltage shift by controlling Ga in solution processed Si-In-Zn-O thin film transistors Choi JY, Kim S, Lee SY |
3778 - 3782 |
Stability and high-frequency operation of amorphous In-Ga-Zn-O thin-film transistors with various passivation layers Nomura K, Kamiya T, Hosono H |
3783 - 3786 |
Effect of magnesium oxide passivation on the performance of amorphous indium-gallium-zinc-oxide thin film transistors Yoo DY, Chong E, Kim DH, Ju BK, Lee SY |
3787 - 3790 |
Effects of low-temperature ozone annealing on operation characteristics of amorphous In-Ga-Zn-O thin-film transistors Ide K, Kikuchi Y, Nomura K, Kamiya T, Hosono H |
3791 - 3795 |
Operation model with carrier-density dependent mobility for amorphous In-Ga-Zn-O thin-film transistors Abe K, Takahashi K, Sato A, Kumomi H, Nomura K, Kamiya T, Hosono H |
3796 - 3799 |
Comparative analysis of temperature thermally induced instability between Si-In-Zn-O and Ga-In-Zn-O thin film transistors Lee SY, Kim DH, Kim B, Jung HK, Kim DH |
3800 - 3802 |
Modeling of amorphous InGaZnO thin film transistors using an empirical mobility function based on the exponential deep and tail states Shin JH, Cheong WS, Hwang CS, Chung SM |
3803 - 3807 |
Influence of rapid thermal annealing on surface texture-etched Al-doped ZnO films prepared by various magnetron sputtering methods Minami T, Hirano T, Miyata T, Nomoto J |
3808 - 3812 |
Photovoltaic properties of n-type amorphous In-Ga-Zn-O and p-type single crystal Si heterojunction solar cells: Effects of Ga content Lee K, Nomura K, Yanagi H, Kamiya T, Hosono H |
3813 - 3818 |
Sputtered nickel oxide thin film for efficient hole transport layer in polymer-fullerene bulk-heterojunction organic solar cell Widjonarko NE, Ratcliff EL, Perkins CL, Sigdel AK, Zakutayev A, Ndione PF, Gillaspie DT, Ginley DS, Olson DC, Berry JJ |
3819 - 3822 |
Influence of Cu2O surface treatment on the photovoltaic properties of Al-doped ZnO/Cu2O solar cells Nishi Y, Miyata T, Nomoto J, Minami T |
3823 - 3828 |
Thermochromic fenestration with VO2-based materials: Three challenges and how they can be met Li SY, Niklasson GA, Granqvist CG |
3829 - 3834 |
Quantum dot phosphors and their application to inorganic electroluminescence device Omata T, Tani Y, Kobayashi S, Otsuka-Yao-Matsuo S |
3835 - 3838 |
Fabricating transparent waveguide for wireless communication Ogino T, Ohashi N, Hishita S, Sakaguchi I, Adachi Y, Nakajima K, Haneda H |
3839 - 3842 |
Electrochromic properties of nickel oxide based thin films sputter deposited in the presence of water vapor Green SV, Watanabe M, Oka N, Niklasson GA, Granqvist CG, Shigesato Y |
3843 - 3846 |
Band-edge luminescence from SrTiO3: No polaron effect Yamada Y, Kanemitsu Y |
3847 - 3851 |
Real-time investigation on photocatalytic oxidation of gaseous methanol with nanocrystalline WO3-TiO2 composite films Sadale SB, Noda K, Kobayashi K, Yamada H, Matsushige K |
3852 - 3856 |
CF4 plasma effect combined with rapid thermal annealing for high-k Er2O3 dielectrics Kao CH, Fan HC, Cheng SN, Liao CJ |
3857 - 3861 |
Investigation of Ti-doped Gd2O3 charge trapping layer with HfO2 blocking oxide for memory application Kao CH, Chen CC, Huang CH, Huang CY, Lin CJ, Ou JC |
3862 - 3864 |
Stable deposition of silicon oxynitride thin films with intermediate refractive indices by reactive sputtering Nakanishi Y, Kato K, Omoto H, Tomioka T, Takamatsu A |