1 - 5 |
Characterization of an epitaxial CaRuO3 film prepared via the sol-gel route Yamada S, Fukuoka N, Taniguchi T, Ozawa TC, Nagata Y, Uchida T, Samata H |
6 - 12 |
Characterization of ferroelectric Bi3.25La0.75Ti3O12 thin films prepared by metal organic decomposition method Kim KT, Kim CI |
13 - 20 |
Pulsed reactive chemical vapor deposition in the C-Ti-Si system from H-2/TiCl4/SiCl4 Jacques S, Di-Murro H, Berthet MP, Vincent H |
21 - 24 |
In situ characterization of stoichiometry for the buried SiOx layers in SiOx/SiO2 superlattices and the effect on the photoluminescence property Kim KJ, Moon DW, Hong SH, Choi SH, Yang MS, Jhe JH, Shin JH |
25 - 29 |
Electrochemical deposition and characterization of wide band semiconductor ZnO thin film Weng J, Zhang YJ, Han GQ, Zhang Y, Xu L, Xu J, Huang XF, Chen KJ |
30 - 33 |
Enhanced second-harmonic generation in Mg0.05Zn0.95O/Mg0.4Zn0.6O multilayers Liu CY, Zhang BP, Binh NT, Wakatsuki K, Segawa Y |
34 - 41 |
Cryogenic deposition of carbon nitride thin solid films by reactive magnetron sputtering; suppression of the chemical desorption processes Neidhardt J, Hogberg H, Hultman L |
42 - 48 |
Microstructure, magnetoresistance and electrical properties of La0.67Sr0.33MnO3 films synthesized from citric acid and ethylene glycol Yang WD, Huang SH, Chang YH |
49 - 55 |
Effect of N-implantation on the structural and electrical characteristics of Ge2Sb2Te5 phase change film Liu B, Song ZT, Zhang T, Xia JL, Feng SL, Chen B |
56 - 60 |
Individual alumina nanotubes coaxially wrapping carbon nanotubes and nanowires Qiu T, Wu XL, Huang GS, Siu GG, Mei YF, Kong F, Jiang M |
61 - 66 |
Structural and magnetic properties of iron-nitride thin films deposited using a filtered cathodic vacuum arc Zhong WH, Tay BK, Lau SP, Sun XW, Li S, Sun CQ |
67 - 71 |
AIN thin films prepared by optical emission spectroscopy-controlled reactive sputtering Brudnik A, Czapla A, Kusior E |
72 - 76 |
Preparation of silver thin films using liquid-phase precursors by metal organic chemical vapor deposition and their conversion to silver selenide films by selenium vapor deposition Kim HK, Jeong HC, Kim KS, Yoon SH, Lee SS, Seo KW, Shim IW |
77 - 90 |
Role of atomic hydrogen density and energy in low power chemical vapor deposition synthesis of diamond films Mills R, Sankar J, Voigt A, He JL, Ray P, Dhandapani B |
91 - 95 |
Investigation of the mechanism of fractal growth of porous silicon dioxide layers from gas phase Dultsev FN |
96 - 102 |
Characterization of spray deposited bismuth oxide thin films and their thermal conversion to bismuth silicate Rico-Fuentes O, Sanchez-Aguilera E, Velasquez C, Ortega-Alvarado R, Alonso JC, Ortiz A |
103 - 108 |
Comparison between ZnO films grown by atomic layer deposition using H2O or O-3 as oxidant Kim SK, Hwang CS, Park SHK, Yun SJ |
109 - 115 |
Properties of aluminum titanate films prepared by chemical vapor deposition under different aluminum butoxide inputs Kuo DH, Shueh CN |
116 - 120 |
The influence of secondary ion beam irradiation on the formation of Si nanocrystals during dual ion beam sputtering Kim JK, Cha KM, Kang JH, Kim Y, Yi JY, Chung TH, Bark HJ |
121 - 124 |
Blue organic electroluminescent device with tetra(beta-naphthyl)silane as hole blocking materials Duan XB, Jiang ZQ, Yu G, Lu P, Liu YQ, Xu XJ, Zhu DB |
125 - 131 |
Effects of annealing on the microstructure of yttria-stabilised zirconia thin films deposited by laser ablation Mengucci P, Barucca G, Caricato AP, Di Cristoforo A, Leggieri G, Luches A, Majnia G |
132 - 136 |
Influence of target direct current bias voltage on the film structure of hydrogenated microcrystalline silicon prepared by direct current-radiofrequency coupled magnetron sputtering Fukaya K, Tabata A, Mizutani T |
137 - 140 |
Phase transformations in sputter deposited NiMn thin films Huang ML, Ladwig PF, Chang YA |
141 - 145 |
Connected fit algorithm for optical investigations of large area coatings Gnehr WM, Hartung U, Kopte T |
146 - 151 |
Optical characterization of MoO3 thin films produced by continuous wave CO2 laser-assisted evaporation Cardenas R, Torres J, Alfonso JE |
152 - 158 |
Fabrication of Au nanostructures in the process of amalgam formation followed by Au-Hg alloy thermal decomposition Kobiela T, Kaszkur Z, Dus R |
159 - 163 |
Epitaxial growth of ruthenium dioxide films by chemical vapor deposition and its comparison with similarly grown chromium dioxide films Miao GX, Gupta A, Xiao G, Anguelouch A |
164 - 169 |
Relation between particle growth kinetics in solution and surface morphology of thin films: implications on the deposition of titania on polyethylene terephthalate Hoffmann RC, Bartolome JC, Wildhack S, Jeurgens LPH, Bill J, Aldinger F |
170 - 175 |
Electrical and optical properties of Zr1-xAlxN thin films Lamni R, Sanjines R, Levy F |
176 - 182 |
Tribological characteristics of diamond-like carbon films based on hardness of mating materials Na BC, Tanaka A |
183 - 187 |
Investigation of the interface region between a porous silicon layer and a silicon substrate Lee KW, Park DK, Kim YY, Shin HJ |
188 - 195 |
Chemical vapor deposition of tantalum nitride with tert-butylimino tris(diethylamino) tantalum and atomic hydrogen Zhao X, Magtoto NP, Kelber JA |
196 - 205 |
Reactive magnetron sputtering of copper, silver, and gold Pierson JF, Wiederkehr D, Billard A |
206 - 217 |
Comparison of precursors for pulsed metal-organic chemical vapor deposition of HFO2 high-K dielectric thin films Teren AR, Thomas R, He JQ, Ehrhart P |
218 - 222 |
Heteroepitaxy of ZnO film on Si(111) substrate using a 3C-SiC buffer layer Zhu JJ, Lin BX, Sun XK, Yao R, Shi CS, Fu ZX |
223 - 227 |
Formation of ZnTe compounds by using the electrochemical ion exchange reaction in molten chloride Kuroda K, Kobayashi T, Sakamoto T, Ichino R, Okido M |
228 - 231 |
Nanofibers of CeO2 via an electrospinning technique Yang XG, Shao CL, Liu YC, Mu RX, Guan HY |
232 - 237 |
Formation of hard tungsten boride layer by spark plasma sintering boriding Khor KA, Yu LG, Sundararajan G |
238 - 247 |
Structure and properties of magnetron sputtered Zr-Si-N films with a high (>= 25 at.%) Si content Musil J, Daniel R, Zeman P, Takai O |
248 - 251 |
Influence of deposition parameters on the properties of sputtered Ge2Sb2Te5 films Dieker H, Wuttig M |
252 - 255 |
Efficiency improvement of organic light-emitting diodes using 8-hydroxy-quinolinato lithium as an electron injection layer Zheng XY, Wu YZ, Sun RG, Zhu WQ, Jiang XY, Zhang ZL, Xu SH |
256 - 260 |
Characterization of bias magnetron-sputtered silicon nitride films Guruvenket S, Ghatak J, Satyam PV, Rao GM |
261 - 264 |
Correlations between grain size and nonlinear dielectric properties of as-deposited SrTiO3 thin films He SM, Li YR, Liu XZ, Tao BW, Li DH, Lu QF |
265 - 270 |
Synthesis and electroluminescence properties of europium(III) complexes with new second ligands Liu Z, Wen FS, Li WL |
271 - 274 |
Color-saturated and highly efficient top-emitting organic light-emitting devices Hsu SF, Lee CC, Hwang SW, Chen HH, Chen CH, Hu AT |
275 - 279 |
Inkjet-printed silver conductors using silver nitrate ink and their electrical contacts with conducting polymers Liu ZC, Su Y, Varahramyan K |
280 - 285 |
Wafer bonding for high-brightness light-emitting diodes via indium tin oxide intermediate layers Liu PC, Hou CY, Wu YCS |
286 - 292 |
Lifetime enhancement of the exciton in a trapezoidal-type InGaN/GaN multi-quantum well structure Kim K, Lee JY, Jeoung SC |
293 - 298 |
Aplication of plasma immersion ion implantation on seeding copper electroplating for multilevel interconnection Chiu SY, Wang YL, Chang SC, Feng MS |
299 - 304 |
New designs for graded refractive index antireflection coatings Mahdjoub A, Zighed L |
305 - 309 |
The charge transfer structure and effective energy transfer in multiplayer assembly film Li MQ, Jian XG |
310 - 317 |
Covalently attached multilayer assemblies of diazo-resins and binuclear cobalt phthalocyanines Li XF, Zhao S, Yang M, Sun CQ, Guo LP |
318 - 325 |
Twisted intra-molecular electron transfer phenomenon of dansyl immobilized on chitosan film and its sensing property to the composition of ethanol-water mixtures Ding LP, Fang Y, Jiang LL, Gao LN, Yin X |
326 - 331 |
Formation of bubbles on electrical contacts to polymer light-emitting diode devices Luo SC, Chung HH, Pashuck ET, Douglas EP, Holloway PH |
332 - 337 |
Room-temperature formation of tantalum oxide films by liquid phase deposition Huang CJ |
338 - 344 |
Interface detection in poly-ethylene terephthalate-metal laminates using variable energy positron annihilation Galindo RE, Schut H, van Veen A, Rastogi R, Vellinga WP, Meijer HEH |
345 - 351 |
Characterization of copper layers grown by electrochemical mechanical deposition technique Wang T, Lindquist P, Erdemli S, Basol EC, Zhang R, Uzoh CE, Basol BM |