Thin Solid Films

Thin Solid Films, Vol.437, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (47 articles)

1 - 9	Synthesis and characterization of Co/ZnO nanocomposites: towards new perspectives offered by metal/piezoelectric composite materials Viart N, Richard-Plouet M, Muller D, Pourroy G
10 - 17	Investigation of electronic quality of chemical bath deposited cadmium sulphide layers used in thin film photovoltaic solar cells Chaure NB, Bordas S, Samantilleke AP, Chaure SN, Haigh J, Dharmadasa IM
18 - 24	Deposition of hydrogenated amorphous silicon (a-Si : H) films by hot wire chemical vapor deposition: role of filament temperature Jadkar SR, Sali JV, Kshrisagar ST, Takwale MG
25 - 33	Infrared reflectance of direct current magnetron sputter deposited films of Ni93V7, Cu89Ni10Fe1(Mn) and Cu Gelin K, Bostrom I, Wackelgard E
34 - 44	Properties of spray deposited tin oxide thin films derived from tri-n-butyltin acetate Patil PS, Kawar RK, Sadale SB, Chigare PS
45 - 50	Effects of silicon tetrachloride concentration on nanocrystalline silicon films growth Wong TC, Wu JJ
51 - 56	An oxidation barrier layer for metal-insulator-metal capacitors: ruthenium silicide Matsui Y, Nakamura Y, Shimamoto Y, Hiratani M
57 - 62	Growth of ultrathin Ti films deposited on SnO2 by magnetron sputtering Godfroid T, Gouttebaron R, Dauchot JP, Leclere P, Lazzaroni R, Hecq M
63 - 67	Argon dilution effects on diamond deposition in electron cyclotron resonance plasma: a double probe study Teii K, Yoshioka H, Ono S, Teii S
68 - 73	Effect of hydrogen dilution on the growth of nanocrystalline silicon films at high temperature by using plasma-enhanced chemical vapor deposition Ali AM, Hasegawa S
74 - 82	Impact of beryllium dopants on the stability of LT-grown AlAs/GaAs : Be heterostructures against thermally activated intermixing Tillmann K, Luysberg M, Specht P, Weber ER
83 - 88	On the influence of substrate temperature for cubic boron nitride growth Le YK, Oechsner H
89 - 94	Molecular-scale growth of silicon oxide on polymer substrate through vacuum ultraviolet light-assisted photooxidation of organosilane precursor Hozumi A, Inagai H, Yokogawa Y, Kameyama T
95 - 100	Crystallized SrFeO3-x films deposited by pulsed laser ablation without in-situ substrate heating Wang ZK, Sasaki T, Koshizaki N, Tunney JJ, Post ML
101 - 107	The effect of MgO substrate roughness on YBa2Cu3O7-delta thin film properties Mitchell EE, Gnanarajan S, Green KL, Foley CP
108 - 115	Formation of tantalum nitride films by rapid thermal processing Angelkort C, Berendes A, Lewalter H, Bock W, Kolbesen BO
116 - 122	Investigation of the structure of beta-tantalum Jiang AQ, Yohannan A, Nnolim NO, Tyson TA, Axe L, Lee SL, Cote P
123 - 126	Study of oxidation process of titanium by oxygen-radical beam assisted evaporation using quartz crystal microbalance Yamada Y, Uyama H, Murata T, Nozoye H
127 - 134	Monitoring photodeposition of polymer films from diacetylene monomer solutions using in situ real-time spectroscopic ellipsometry Hui D, Kim JS, Kim YT, An I, Paley MS
135 - 139	Valence band offset at silicon/silicon nitride and silicon nitride/silicon oxide interfaces Gritsenko VA, Shaposhnikov AV, Kwok WM, Wong H, Jidomirov GM
140 - 149	Helical-type surface defects in InGaN thin films epitaxially grown on GaN templates at reduced temperatures Miraglia PQ, Preble EA, Roskowski AM, Einfeldt S, Lim SH, Liliental-Weber Z, Davis RF
150 - 154	Influence of surface hydrophobicity of substrates on the self-organization of chiral molecule Zhang YJ, Lu R, Liu QS, Song YL, Jiang L, Liu YC, Zhao YY, Li TJ
155 - 163	Acid-base properties of the crosslinked polysaccharide-polyimine layer deposited on the surface of siliceous material (acid-base properties of the polysaccharide-polyimine layer) Dawidowicz AL, Wianowska D, Janusz W
164 - 169	Influence of low energy ion implantation on mechanical properties of magnetron sputtered metastable (Cr,Al)N thin films Ulrich S, Holleck H, Ye J, Leiste H, Loos R, Stuber M, Pesch P, Sattel S
170 - 175	Effect of the substrate bias potential on crystalline grain size, intrinsic stress and hardness of vacuum arc evaporated TiN/c-Si coatings Espinoza-Beltran FJ, Che-Soberanis O, Garcia-Gonzalez L, Morales-Hernandez J
176 - 181	Elastic-plastic characterization of thin films using nanoindentation technique Shan ZH, Sitaraman SK
182 - 187	Film-thickness considerations in microcantilever-beam test in measuring mechanical properties of metal thin film Son D, Jeong JH, Kwon D
188 - 196	Electro-stress migration induced instability at heterogenous interfaces Decuzzi P
197 - 203	Combinatorial approach to the edge delamination test for thin film reliability - concept and simulation Chiang MYM, Wu WL, He JM, Amis EJ
204 - 210	Mechanical analysis of ultrathin oxide coatings on polymer substrates in situ in a scanning electron microscope Rochat G, Leterrier Y, Fayet P, Manson JAE
211 - 216	Reactive pulsed laser deposition of silica and doped silica thin films Ford AC, Tepper T, Ross CA
217 - 222	High third-order non-resonant optical non-linearities of surface modified US quantum dots embedded in BaTiO3 thin film Yang Y, Shi JL, Dai SG, Zhao XG, Wang XH
223 - 229	Optical properties of amorphous PbZrxTi1-xO3 (x=0.52) thin films prepared by RF magnetron sputtering Hu ZG, Huang ZM, Lai ZQ, Wang GS, Chu JH
230 - 234	Fabrication of silicon nanostructured films by deposition of size-selected nanoparticles generated by pulsed laser ablation Seto T, Orii T, Hirasawa M, Aya N
235 - 241	Observation of amorphous chromium in modified C4 flip chip solder joints after thermal stress testing Hooghan TK, Nakahara S, Hooghan K, Privette RW, Bachman MA, Moyer RS
242 - 247	The effect of the amorphous insulator layer on conduction behaviors of the silica/indium tin oxide two-layer films Kim SW, Shin YW, Bae DS, Lee JH, Kim J, Lee HW
248 - 256	Structure and thermal stability of graded Ta-TaN diffusion barriers between Cu and SiO2 Hubner R, Hecker M, Mattern N, Hoffmann V, Wetzig K, Wenger C, Engelmann HJ, Wenzel C, Zschech E, Bartha JW
257 - 265	Thickness and optical constant distributions of PECVD a-SiCx : H thin films along electrode radial direction Akaoglu B, Atilgan I, Katircioglu B
266 - 271	Optical absorption threshold of low pressure chemically vapor deposited silicon oxynitride films from SiCl2H2-NH3-N2O mixtures Davazoglou D
272 - 275	Microstructural characterization of YBa2Cu3O7-x thin films grown on Y-ZrO2 Liu CX, Chen XM, Wang Y, Xu M, Luo GM, Mai ZH, Tang WH, Gao J, Jia QJ, Zheng WL, Chen ZJ
276 - 279	Synthetic opals made by the Langmuir-Blodgett method Bardosova M, Hodge P, Pach L, Pemble ME, Smatko V, Tredgold RH, Whitehead D
280 - 284	Novel alternating polymer adsorption/surface activation self-assembled film based on hydrogen bond Zhang YJ, Yang SG, Guan Y, Miao XP, Cao WX, Xu J
285 - 289	Effect of laser fluence on the ferroelectric properties of pulsed laser deposited (Pb1-xLax)Ti1-x/4O3 thin films Han KB, Jeon CH, Jhon HS, Lee SY
290 - 296	Raman and X-ray studies of nanocrystals in porous stain-etched germanium Karavanskii VA, Lomov AA, Sutyrin AG, Bushuev VA, Loikho NN, Melnik NN, Zavaritskaya TN, Bayliss S
297 - 307	Formation of CuInSe2 by the annealing of stacked elemental layers - analysis by in situ high-energy powder diffraction Brummer A, Honkimaki V, Berwian P, Probst V, Palm J, Hock R
308 - 308	Impedance study on electrochemical characteristics of sputtered DLC films (vol 426, pg 258, 2003) Zeng A, Liu E, Zhang S, Tan SN, Hing P, Annergren IF, Gao J
309 - 309	Ferrimagnetic 4f spin order in O/Gd surface monoxide Krupin OW, Prieto JE, Gorovikov S, Starke K, Kaindl G