Thin Solid Films

Thin Solid Films, Vol.340, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (55 articles)

1 - 6	Fabrication of diamond microstructures for microelectromechanical systems (MEMS) by a surface micromachining process Ramesham R
7 - 10	H- ESD observed from beta-state NH3 adsorbed on Pt(111) Bater C, Campbell JH, Craig JH
11 - 12	Electrosynthesis of the molybdenum disulphide thin films and characterization Patil RS
13 - 17	Microstructure analyses of the titanium films formed by the ionized sputtering process Ko DH, Kim EH, Choi S, Yoo BY, Lee HD
18 - 23	Chemical bath deposition of indium sulphide thin films: preparation and characterization Lokhande CD, Ennaoui A, Patil PS, Giersig M, Diesner K, Muller M, Tributsch H
24 - 27	Temperature determination by solubility measurements and a study of evaporation of volatile components in LPE Mishurnyi VA, de Anda F, del Castillo ICH, Gorbatchev AY
28 - 32	Field-lowering carrier excitation in cadmium arsenide thin films Din M, Gould RD
33 - 39	Micro-scratch analysis and mechanical properties of plasma-deposited silicon-based coatings on polymer substrates Rats D, Hajek V, Martinu L
40 - 44	Anisotropy in wear processes measured by scanning probe microscopy Schouterden K, Lairson BM
45 - 52	Chemical vapor deposition of copper-cobalt binary films Gu S, Atanasova P, Hampden-Smith MJ, Kodas TT
53 - 61	Fabrication and characterization of (1-x)SrBi2Ta2O9-xBi(3)TaTiO(9) layered structure solid solution thin films for ferroelectric random access memory (FRAM) applications Ryu SO, Tirumala S, Joshi PC, Desu SB
62 - 67	Deposition of polymeric nitrogenated amorphous carbon films (a-C : H : N) using electron cyclotron resonance CVD Yoon SF, Rusli X, Ahn J, Zhang Q, Yang CY, Yang H, Watt F
68 - 71	Quantitative analysis of the oxygen content in BaTiO3 films deposited by PLD using O-16(alpha,alpha)O-16 resonant elastic scattering Li W, Lu F, Liu ZG, Zhu Y, Wang FX, Liu XD, Tan CY, Wang KM
72 - 76	Growth of yttria stabilized zirconia thin films by metallo-organic, ultrasonic spray pyrolysis Matsuzaki Y, Hishinuma M, Yasuda I
77 - 86	Non-vacuum laser deposition of buffer layers for coated conductors Dahotre NB, Semak V, Xiao CH, McCay MH
87 - 94	Ellipsometric analysis of the oxidation of alpha-Fe and epsilon-Fe2N1-x Graat PCJ, Somers MAJ, Mittemeijer EJ
95 - 105	Structural characterization of CxByNz (x = 0.1 to x = 0.2) layers obtained by laser-driven synthesis Morjan I, Conde O, Oliveira M, Vasiliu F
106 - 109	Separation of CO2 and CH4 through two types of polyimide membrane Zhang JY, Lu JJ, Liu WM, Xue QJ
110 - 116	Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films Aarik J, Aidla A, Kiisler AA, Uustare T, Sammelselg V
117 - 124	Electrodeposition of CuInSe2 thin films in a glycine acid medium Ugarte R, Schrebler R, Cordova R, Dalchiele EA, Gomez H
125 - 131	Preparation and photoelectrochemical properties of Ti1-xVxO2 solid solution thin film photoelectrodes with gradient bandgap Zhao GL, Kozuka H, Lin H, Takahashi M, Yoko T
132 - 136	Total dose radiation effects of Au/PbZr0.52Ti0.48O3/YBa2Cu3O7-delta capacitors Gao JX, Zheng LR, Duo XZ, Huang JP, Yang LX, Lin CL, Yan RL
137 - 139	Preparation of AlN thin films by nitridation of Al-coated Si substrate Huang JP, Wang LW, Shen QW, Lin CL, Ostling M
140 - 144	Epitaxial growth of RuO2 thin films by metal-organic chemical vapor deposition Lu P, He S, Li FX, Jia QX
145 - 152	Intensity profiles along the RHEED streaks for various thin film surface morphologies Mae K, Moshchalkov VV, Bruynseraede Y
153 - 158	Neutron and X-ray reflectivity analysis of ceramic-metal materials Gibaud A, Sella C, Maaza M, Sung L, Dura JA, Satija SK
159 - 163	Correlation between the OES plasma composition and the diamond film properties during microwave PA-CVD with nitrogen addition Vandevelde T, Wu TD, Quaeyhaegens C, Vlekken J, D'Olieslaeger M, Stals L
164 - 168	Electrical characterization of Ta2O5 films deposited by laser reactive ablation of metallic Ta Fu ZW, Len LY, Qin QZ
169 - 174	A novel approach to the formation of amorphous carbon nitride film on silicon by ECR-CVD Sung SL, Tseng CH, Chiang FK, Guo XJ, Liu XW, Shih HC
175 - 182	Growth and characterization of AP-MOCVD iron doped titanium dioxide thin films Gauthier V, Bourgeois S, Sibillot P, Maglione M, Sacilotti M
183 - 188	AFM characterization of the structure of Au-colloid monolayers and their chemical etching Doron A, Joselevich E, Schlittner A, Willner I
189 - 193	Effect of surfactant concentration on the size of coated ferromagnetic nanoparticles Prozorov T, Kataby G, Prozorov R, Gedanken A
194 - 200	Abrasion of thin films deposited onto glass by the Taber test Suzuki S, Ando E
201 - 204	Ion irradiation hardening of C-60 thin films Foerster CE, Lepienski CM, Serbena FC, Zawislak FC
205 - 209	Stress formation and relaxation in amorphous Ta-Cr films Andersen P, Moske M, Dyrbye K, Bottiger J
210 - 217	Micro/nanomechanical characterization of ceramic films for microdevices Li XD, Bhushan B
218 - 220	Information storage based on photochemical effects in mixed Langmuir-Blodgett films Ricceri R, Abbotto A, Facchetti A, Pagani GA, Gabrielli G
221 - 229	Conductivity mechanisms in poly(p-phenylene vinylene) light-emitting diodes at high and low bias Jones R, Krier A, Davidson K, Schmit JPN, Zawadzka J
230 - 232	Enhanced luminescence of silica thin films co-doped with Er3+ and Yb3+ Gu G, Ong PP, Cai JH, Yang W, Du YW, Yang SH
233 - 236	Refractive indices and thicknesses of optical waveguides fabricated by silicon ion implantation into silica glass Gazecki J, Kubica JM, Zamora M, Reeves GK, Johnson CM, Ridgway MC
237 - 241	Electrical stability of polyimide siloxane films for interlayer dielectrics in multilevel interconnections Homma T, Yamaguchi M, Kutsuzawa Y, Otsuka N
242 - 249	Drying temperature effects on microstructure, electrical properties and electro-optic coefficients of sol-gel derived PZT thin films Lee C, Spirin V, Song H, No K
250 - 256	Charge migration on hydrophobic and hydrophilic silicon dioxide Hedborg E, Winquist F, Sundgren H, Lundstrom I
257 - 261	X-ray photoelectron spectroscopy study of Langmuir-Blodgett films of N-octadecyl-8-hydroxy-2-quinoline carboxamide deposited from subphases containing metal ions Ouyang JM, Zheng WJ, Huang NX, Tai ZH
262 - 264	Photoelectric responses of Langmuir-Blodgett film containing bacteriorhodopsin on ITO modified with polypyrrole film Yuan LS, Li BF, Jiang L
265 - 270	Central metal effect on the organization of porphyrin LB films Liu HG, Feng XS, Xue QB, Wang L, Yang KZ
271 - 273	The anisotropic gas response behavior of LB films of an amphiphilic asymmetrically substituted phthalocyanine Ding XM, Xu HJ, Zhang LG, Jiang DP, Lu A
274 - 279	Selective ultrathin gold deposition by organometallic chemical vapor deposition onto organic self-assembled monolayers (SAMs) Wohlfart P, Weiss J, Kashammer J, Winter C, Scheumann V, Fischer RA, Mittler-Neher S
280 - 287	Consequences of TiO2 doping on the optical properties of porous silica layers coated on silica optical fibers Abdelmalek F, Lacroix M, Chovelon JM, Jaffrezic-Renault N, Berkova D, Matejec V, Kasik I, Chomat M, Gagnaire H
288 - 291	Effect of a noble metal coating on a natural aluminum oxide film. Kuzik LA, Yakovlev VA
292 - 296	Ion transport studies on vacuum deposited PbSnI4 thin films Kuku TA
297 - 300	Transport property of Sn-doped In0.5Ga0.5P layers grown by liquid phase epitaxy Yoon IT, Park HL
301 - 305	On the interpretation of Fe-57 Mossbauer spectra from CdTe thin films with substitutions of Fe, In, and Sb Yee-Madeira H, Reguera E, Zelaya-Angel O, Montiel-Sanchez H, Sanchez-Sinencio F, Scorzelli RB
306 - 316	Morphology of sputter deposited Al alloy films Onishi T, Iwamura E, Takagi K
317 - 317	Experimental and numerical analysis of rapid reaction to initiate the radical chain reactions in WSix CVD (vol 320, pg 151, 1998) Chae YK, Egashira Y, Shimogaki Y, Sugawara K, Komiyama H