1 - 5 |
Highly transparent and flexible TiN doped In2O3 (ITON)/Ag-Ti/ITON multilayer electrodes coated on polyethylene terephthalate substrate Lee JE, Kim HK |
6 - 14 |
Comparison of thickness determination methods for physical-vapor-deposited aluminum coatings in packaging applications Lindner M, Hoflsauer F, Heider J, Reinelt M, Langowski HC |
15 - 19 |
Study of Cu2CdGeSe4 monograin powders synthesized by molten salt method for photovoltaic applications Kauk-Kuusik M, Li X, Pilvet M, Timmo K, Grossberg M, Raadik T, Danilson M, Mikli V, Altosaar M, Krustok J, Raudoja J |
20 - 27 |
Study of aluminium oxide thin films deposited by plasma-enhanced atomic layer deposition from tri-methyl-aluminium and dioxygen precursors: Investigation of interfacial and structural properties Lale A, Scheid E, Cristiano F, Datas L, Reig B, Launay J, Temple-Boyer P |
28 - 33 |
Preparation of cadmium zinc sulfide (Cd1-xZnxS) thin films from acidic chemical baths Abza T, Ampong FK, Hone FG, Nkum RK, Boakye F |
34 - 39 |
Effect of substrate temperature on the structural and optical properties of radio frequency sputtered tin sulfide thin films for solar cell application Arepalli VK, Kim J |
40 - 43 |
The effect of Cu-Zn disorder on charge carrier mobility and lifetime in Cu2ZnSnSe4 Hempel H, Eichberger R, Repins I, Unold T |
44 - 47 |
Optical and structural properties of orthorhombic and tetragonal polymorphs of Cu2CdGeSe4 Grossberg M, Raadik T, Krustok J, Kauk-Kuusik M, Timmo K, Kaupmees R, Mikli V, Mere A |
48 - 53 |
Free volume gradient effect on shear banding behavior in CuZr/CuZr multilayers Ma CF, Huang P, Xu KW, Wang F, Lu TJ |
54 - 60 |
Immobilization of carboxylic acid groups on polymeric substrates by plasma-enhanced chemical vapor or atmospheric pressure plasma deposition of acetic acid Chen WY, Matthews A, Jones FR, Chen KS |
61 - 65 |
Characterization of Cu2SnS3 thin films prepared by sulfurization of co-evaporated Cu-SnS precursor layers Kim Y, Choi IH, Park SY |
66 - 75 |
Three-body abrasive wear of hard coatings: Effects of hardness and roughness Gheisari R, Polycarpou AA |
76 - 84 |
Nickel dependence of hydrogen generation, hydrogen co-deposition and film stress in an electroless copper process Sharma T, Landry AE, Leger A, Brown DA, Bernhard T, Zarwell S, Bruning F, Bruning R |
85 - 93 |
Effect of thermal annealing on nebulizer spray deposited tin sulfide thin films and their application in a transparent oxide/CdS/SnS heterostructure Arulanantham AMS, Valanarasu S, Jeyadheepan K, Kathalingam A |
94 - 99 |
The influence on electrical characteristics of amorphous indium tungsten oxide thin film transistors with multi-stacked active layer structure Ruan DB, Liu PT, Gan KJ, Chiu YC, Yu MC, Chien TC, Chen YH, Kuo PY, Sze SM |
100 - 107 |
A robust superhydrophobic Zn coating with ZnO nanosheets on steel substrate and its self-cleaning property Li H, Yu SR, Hu JH, Liu EY |
108 - 112 |
Femtosecond reflectivity study of photoacoustic responses in bismuth thin films Shin T |
113 - 120 |
Anatase phase evolution and its stabilization in ion beam sputtered TiO2 thin films Poddar NP, Mukherjee SK, Gupta M |
121 - 129 |
High energy pulsed laser deposition of ohmic tungsten contacts on silicon at room temperature Dellasega D, Bollani M, Anzi L, Pezzoli A, Chrastina D, Gulinatti A, Irde G, Sordan R, Passoni M, Pietralunga SM |
130 - 136 |
Structure of nanoporous VNx thin films obtained by ion-beam assisted deposition technology Guglya A, Kalchenko A, Solopikhina E, Voyevodin V, Vasilenko R, Vlasov V, Lyubchenko E |
137 - 142 |
Wetting and photocatalytic properties of Ni-doped TiO2 coating on glazed ceramic tiles under visible light Barmeh A, Nilforoushan MR, Otroj S |
143 - 149 |
Electrical and structural characteristics of sputtered c-oriented AlN thin films on Si (100) and Si (110) substrates Pandey A, Kaushik J, Dutta S, Kapoor AK, Kaur D |
150 - 155 |
The morphological control of MoS2 films using a simple model under chemical vapor deposition Wu S, Zeng X, Wang W, Zeng Y, Hu Y, Yin S, Lu J, Zhou G |
156 - 160 |
WO3-doped LiF as gate dielectric for p-channel vertical organic field effect transistor application Verma R, Suman CK, Srivastava R |
161 - 171 |
Effects of cathodic electrodeposition conditions on morphology and photoelectrochemical response of alpha-Fe2O3 photoanode Liang PH, Li LZ, Liu CH, Wang WC, Zhang HL, Mitsuzaki N, Chen ZD |
172 - 176 |
Fabrication of stoichiometric oriented Ag2Se thin film by laser ablation Tveryanovich YS, Razumtcev AA, Fazletdinov TR, Tverjanovich AS, Borisov EN |
177 - 181 |
A nanoporous substrate-based low temperature solid oxide fuel cell using a thin film Ni anode Lee S, Cho GY, Park T, Lee YH, Yu W, Lee Y, Chang I, Cha SW |
182 - 184 |
Halide vapor phase epitaxy of Si doped beta-Ga2O3 and its electrical properties Goto K, Konishi K, Murakami H, Kumagai Y, Monemar B, Higashiwaki M, Kuramata A, Yamakoshi S |
185 - 190 |
Enhanced thermoelectric performance of Ga-doped ZnO film by controlling crystal quality for transparent thermoelectric films Tomeda A, Ishibe T, Taniguchi T, Okuhata R, Watanabe K, Nakamura Y |