화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.25, No.4 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (7 articles)

303 - 317 Effect of ion energy on structure and composition of cathodic arc deposited alumina thin films
Rosen J, Mraz S, Kreissig U, Music D, Schneider J
319 - 349 Condensation of argon, monosilane and their mixtures in a pulse free jet
Korobeishchikov NG, Zarvin AE, Madirbaev VZ, Sharafutdinov RG
351 - 370 Laser-induced fluorescence (LIF) probe for in-situ nitric oxide concentration measurement in a non-thermal pulsed corona discharge plasma reactor
Hu XD, Zhao GB, Garikipati SVBJ, Nicholas K, Legowski SF, Radosz M
371 - 386 Conversion of NO in NO/N-2, NO/O-2/N-2, NO/C2H4/N-2 and NO/C2H4/O-2/N-2 systems by dielectric barrier discharge plasmas
Zhu AM, Sun Q, Niu JH, Xu Y, Song ZM
387 - 401 Elimination of carbon monoxide in the gas streams by dielectric barrier discharge systems with Mn catalyst
Chang CL, Lin TS
403 - 425 Statistical analysis of the motion and heating of particles in a plasma jet
Zhang T, Liu B, Bao Y, Gawne DT
427 - 437 Surface modification of polypropylene non-woven fabrics by atmospheric-pressure plasma activation followed by acrylic acid grafting
Cernakova L, Kovacik D, Zahoranova A, Cernak M, Mazur M