Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.20, No.4 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (6 articles)
| 429 - 451 |
On the nonlocal electron kinetics in s and p striations of DC glow discharge plasmas: II. Electron properties in periodic states Sigeneger F, Winkler R |
| 453 - 467 |
Effect of water vapor on benzene decomposition using a nonthermal-discharge plasma reactor Ogata A, Shintani N, Yamanouchi K, Mizuno K, Kushiyama S, Yamamoto T |
| 469 - 494 |
Reaction mechanisms in both a CCl2F2/O-2/Ar and a CCl2F2/H-2/Ar RF plasma environment Wang YF, Lee WJ, Chen CY, Wu YPG, Chang-Chien GP |
| 495 - 509 |
Study on reduction of energy consumption in pulsed corona discharge process for NOx removal Chung JW, Cho MH, Son BH, Mok YS, Namkung W |
| 511 - 520 |
Synthesis of ammonia in a strong electric field discharge at ambient pressure Bai MD, Bai XY, Zhang ZT, Bai MD |
| 521 - 553 |
Mathematical modeling of silica anode decomposition Addona T, Proulx P, Munz RJ |